Nonvolatile memory device, programming method of nonvolatile memory device and memory system including nonvolatile memory device

ABSTRACT

Disclosed are a program method and a nonvolatile memory device. The method includes receiving program data to be programmed in memory cells; reading the memory cells to judge an erase state and at least one program state; performing a state read operation in which the at least one program state is read using a plurality of state read voltages; and programming the program data in the memory cells using a plurality of verification voltages having different levels according to a result of the state read operation. Also disclosed are methods using a plurality of verification voltages selected based on factors which may affect a threshold voltage shift or other characteristic representing the data of a memory cell after programming.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a Divisional application of and claims priorityunder to U.S. patent application Ser. No. 13/648,290 filed on Oct. 10,2012, which claims priority under 35 U.S.C §119 to Korean PatentApplication No. 10-2011-0104753 filed Oct. 13, 2011, the entirety ofeach of which is incorporated by reference herein.

BACKGROUND

The inventive concepts described herein relate to a semiconductor memorydevice, and more particularly, relate to a program method of anonvolatile memory device and a memory system including the nonvolatilememory device.

A semiconductor memory device may be fabricated using semiconductorssuch as silicon (Si), germanium (Ge), gallium arsenide (GaAs), indiumphosphide (InP), and the like. Semiconductor memory devices areclassified into volatile memory devices and nonvolatile memory devices.

Volatile memory devices may lose stored data when they are turned off orotherwise lack power. Volatile memory devices include static RAM (SRAM),dynamic RAM (DRAM), synchronous DRAM (SDRAM), and the like. Nonvolatilememory devices may retain stored contents even when turned off orotherwise lacking a power source. Nonvolatile memory devices includeread only memory (ROM), programmable ROM (PROM), electricallyprogrammable ROM (EPROM), electrically erasable and programmable ROM(EEPROM), flash memory, phase-change RAM (PRAM), magnetic RAM (MRAM),resistive RAM (RRAM), ferroelectric RAM (FRAM), and the like. The flashmemory device includes NOR type flash memory and NAND type flash memory.

Recently, a semiconductor memory device with a three-dimensional memoryarray structure has been developed.

SUMMARY

Example embodiments provide a programming method of a nonvolatile memorydevice which comprises receiving program data to be programmed in memorycells; reading the memory cells to judge an erase state and at least oneprogram state; performing a state read operation in which the at leastone program state is read using a plurality of state read voltages; andprogramming the program data in the memory cells using a plurality ofverification voltages having different levels according to a result ofthe state read operation.

In example embodiments, programming the program data in the memory cellcomprises programming memory cells being programmed to a program stateusing at least two verification voltages having different levelsaccording to the result of the state read operation.

In example embodiments, at the state read operation, the at least oneprogram state is read using a first state read voltage and a secondstate read voltage higher than the first state read voltage.

In example embodiments, the first state read voltage has the same levelas a verification voltage used when the at least one program state isprogrammed.

In example embodiments, first memory cells, read as memory cells eachhaving a threshold voltage higher than the second state read voltage atthe state read operation, among memory cells being programmed to thesame program state are programmed using a first verification voltage,second memory cells read as memory cells each having a threshold voltagehigher than the first state read voltage and lower than the second stateread voltage are programmed using a second verification voltage higherthan the first verification voltage, and third memory cells read asmemory cells each having a threshold voltage lower than the first stateread voltage are programmed using a third verification voltage higherthan the second verification voltage.

In example embodiments, when the memory cells are programmed with theprogram data, a first verification voltage, a second verificationvoltage, and a third verification voltage are applied sequentially to aword line connected with the memory cells after a program voltage isapplied to the word line.

In example embodiments, the program method further comprises programmingthe result of the state read operation in memory cells of a supplementalmemory area.

In example embodiments, the program method further comprises receivingsecond program data to be programmed in the memory cells; reading theresult of the state read operation programmed in the memory cells of thesupplemental memory area; and programming the memory cells with thesecond program data using a plurality of verification voltages havingdifferent levels according to the result of the sate read operation readfrom the memory cells of the supplemental memory area.

In example embodiments, the program method further comprises outputtingthe result of the state read operation to the outside.

Example embodiments also provide a program method of a nonvolatilememory device comprising receiving program data to be programmed inmemory cells; reading the memory cells to judge an erase state and atleast one program state; performing a state read operation in which theat least one program state is read using a plurality of first state readvoltages and the erase state is read using a plurality of second stateread voltages; and programming the memory cells with the program datausing a plurality of verification voltages having different levelsaccording to a result of the state read operation.

Example embodiments also provide a program method of a nonvolatilememory device comprising receiving program data to be programmed inmemory cells; judging whether the program data corresponds to an MSBprogram operation; and when the program data corresponds to an MSBprogram operation, reading the memory cells to judge an erase state andat least one program state, performing a state read operation in whichthe at least one program state is read using a plurality of readvoltages, and programming the memory cells with the program data using aplurality of verification voltages having different levels according toa result of the state read operation, wherein at the state readoperation, each program state is read using at least two state readvoltages having different levels.

Example embodiments also provide a program method of a nonvolatilememory device which includes a plurality of cell strings provided on asubstrate, each cell string including a plurality of cell transistorsstacked in a direction perpendicular to the substrate and each celltransistor having an information storage film being an insulator, theprogram method comprising receiving program data to be programmed inmemory cells; reading the memory cells to judge an erase state and atleast one program state; performing a state read operation in which theat least one program state is read using a plurality of state readvoltages; and programming the program data in the memory cells using aplurality of verification voltages having different levels according toa result of the state read operation.

Example embodiments also provide a program method of a nonvolatilememory device which includes a plurality of cell strings provided on asubstrate, each cell string including a plurality of cell transistorsstacked in a direction perpendicular to the substrate and each celltransistor having an information storage film being an insulator, theprogram method comprising receiving program data to be programmed infirst memory cells; reading data from second memory cells connected withat least one word line just adjacent to a word line connected with thefirst memory cells; and programming the first memory cells with theprogram data using a plurality of verification voltages having differentlevels according to the read data from the second memory cells, whereinmemory cells being programmed to a program state are programmed usingverification voltages having different levels according to the readdata.

In example embodiments, the program method further comprises receivingsecond program data to be programmed in memory cells connected with atleast one another word line just adjacent to a word line connected withthe memory cells, memory cells being programmed to the program statebeing programmed using the verification voltages having different levelsaccording to the read data and the second program data.

Example embodiments also provide a nonvolatile memory device comprisinga memory cell array including a plurality of memory cells connected tobit lines and word lines; an address decoding unit configured to applyread voltages to a selected word line, to apply state read voltages, andto apply a program voltage and verification voltages, at a programoperation; and a page buffer unit including a plurality of page buffers,each page buffer including a data latch and a rearrangement latch,wherein the data latch stores program data to be programmed and stores aread result when the read voltages are applied to the selected word lineand the rearrangement latch stores a state read result when the stateread voltages are applied; and wherein when the program voltage and theverification voltages are applied, each page buffer biases a bit lineaccording to data stored in the data latch and data stored in therearrangement latch.

In example embodiments, at least two state read voltages of the stateread voltages have levels between levels of two read voltages being justadjacent from among the read voltages.

In example embodiments, each page buffer biases the bit line with apower supply voltage or a ground voltage according to data stored in thedata latch before the program voltage is applied.

In example embodiments, when the verification voltages are applied, eachpage buffer is configured to select a valid verification voltageaccording to data stored in the rearrangement latch.

In example embodiments, the memory cell array is divided into a userdata area and a supplemental area, the state read result stored in therearrangement latch being programmed in the supplemental area.

In example embodiments, when second program data corresponding to thesame address as the program data is programmed, the address decodingunit applies second read voltages to the selected word line of the userdata area, third read voltages to a selected word line of thesupplemental area, and a second program voltage and second verificationvoltages to the selected word line of the user data area; wherein thedata latch stores the second program data and stores a second readresult when the second read voltages are applied; the rearrangementlatch stores a third read result when the third read voltages areapplied; and the second program voltage and the second verificationvoltages are applied, each page buffer biases the bit line according todata stored in the data latch and data stored in the rearrangementlatch.

Example embodiments also provide a nonvolatile memory device comprisinga memory cell array including a plurality of memory cells connected tobit lines and word lines; an address decoding unit configured to applyread voltages, state read voltages, and a program voltage andverification voltages to a selected word line, at a program operation onMSB data; and a page buffer unit including a plurality of page buffers,each page buffer including a data latch and a rearrangement latch whichare connected to a bit line, wherein the data latch stores data to beprogrammed and stores a read result when the read voltages are appliedto the selected word line and the rearrangement latch stores a stateread result when the state read voltages are applied; and wherein at theprogram operation of the MSB data, each page buffer biases the bit lineaccording to data stored in the data latch and the rearrangement latchwhen the program voltage and the verification voltages are applied.

Example embodiments also provide a nonvolatile memory device comprisinga memory cell array including a plurality of memory cells connected tobit lines and word lines; an address decoding unit configured to applyfirst read voltages to a selected word line, to apply second readvoltages to at least one word line just adjacent to the selected wordline, and to apply a program voltage and verification voltages to theselected word line, at a program operation; and a page buffer unitincluding a plurality of page buffers, each page buffer including a datalatch and a rearrangement latch, wherein the data latch stores programdata to be programmed and stores a first read result when the first readvoltages are applied to the selected word line and the rearrangementlatch stores a second read result when the second read voltages areapplied to the at least one word line; and wherein when the programvoltage and the verification voltages are applied, each page bufferbiases a bit line according to data stored in the data latch and datastored in the rearrangement latch.

Example embodiments also provide a memory system comprising anonvolatile memory device; and a controller configured to control thenonvolatile memory device, wherein the nonvolatile memory devicecomprises a memory cell array including a plurality of memory cellsconnected to bit lines and word lines; an address decoding unitconfigured to apply read voltages to a selected word line, to applystate read voltages, and to apply a program voltage and verificationvoltages, at a program operation; and a page buffer unit including aplurality of page buffers, each page buffer including a data latch and arearrangement latch, wherein the data latch stores program data to beprogrammed and stores a read result when the read voltages are appliedto the selected word line and the rearrangement latch stores a stateread result when the state read voltages are applied; and wherein whenthe program voltage and the verification voltages are applied, each pagebuffer biases a bit line according to data stored in the data latch anddata stored in the rearrangement latch.

In example embodiments, the controller stores the state read resultoutput from the nonvolatile memory device to control a program, read, orerase operation of the nonvolatile memory device according to the storedstate read result.

In example embodiments, the nonvolatile memory device and the controllerconstitute a memory card.

In example embodiments, the nonvolatile memory device and the controllerconstitute a Solid State Drive (SSD).

Example embodiments also provide a program method of a nonvolatilememory device comprising reading data stored in memory cells of a bufferarea to judge an erase state and at least one program state of memorycells of a user data area corresponding to memory cells of the bufferarea; judging whether a fine program operation on memory cells of theuser data area is performed; and if the fine program operation is judgedto be performed, performing a state read operation on the at least oneprogram state of memory cells of the user data area using a plurality ofstate read voltages to perform the fine program operation using aplurality of verification voltages having different levels according toa result of the state read operation, wherein at the state readoperation, each program state is read using a plurality of state readvoltages having different levels.

Example embodiments also provide a program method of a nonvolatilememory device comprising receiving program data to be programmed inmemory cells; reading the memory cells to judge an erase state and atleast one program state; reading memory cells of a test data areacorresponding to the memory cells; and programming the memory cells withthe program data using a plurality of verification voltages havingdifferent levels according to a read result on memory cells of the testdata area, wherein programming the memory cells with the program dataincludes programming memory cells being programmed to one program stateusing verification voltages having different levels according to a readresult on memory cells of the test data area.

Example embodiments also provide a program method of a nonvolatilememory device comprising receiving program data to be programmed inmemory cells; iterating a first program loop in which a program voltageand a verification voltage are respectively applied once to the memorycells, until a threshold condition is satisfied, if the thresholdcondition is satisfied, performing a state read operation on memorycells having an intermediate state higher than an erase state, using atleast two state read voltages having different levels; and performing asecond program loop in which a program voltage and at least twoverification voltages having different levels are applied to the memorycells using a plurality of verification voltages having different levelsaccording to a result of the state read operation.

In example embodiments, the threshold condition includes a conditionindicating that memory cells being first program passed of the memorycells are detected.

In example embodiments, the threshold condition includes a conditionindicating that the number of program passed memory cells of the memorycells is over a specific value.

In example embodiments, the threshold condition includes a conditionindicating that an iterated number of the first program loop is over aspecific value.

Example embodiments also include a method of programming a non-volatilememory comprising: determining a tendency of a threshold voltage of afirst memory cell transistor to shift from a programmed state, andselecting a first verification voltage from a plurality of verificationvoltages in response to the determining, and programming the firstmemory cell transistor to alter the threshold voltage of the firstmemory cell transistor, the programming including verifying thethreshold voltage of first memory cell transistor has been alteredsufficiently using the first verification voltage.

Example embodiments also include a method of programming a row of memorycells, comprising selecting a first row of memory cells among aplurality of rows selecting a first subset of the memory cells of thefirst row to change a detectable characteristic of the first subset ofthe memory cells to within a first program state range, the firstprogram state range representing a value of at least a first bit ofdata, programming the first subset of memory cells to change thecharacteristic of each of the first subset of the memory cells,including verifying the change of the characteristic of some of thefirst subset of memory cells with a first verification level, andverifying others of the first subset of memory cells with a secondverification level that is different from the first verification level.

Example embodiments also include a method of programming a memorydevice, comprising programming a first plurality of memory cells to afirst program state of a plurality of program states, each program staterepresenting a unique set of values of plural data bits, the firstplurality of memory cells connected to a first word line, theprogramming comprising a plurality of program loops, each program loopcomprising: (a) applying a program voltage to the word line; (b)applying a first verify voltage to the word line to verify a firstsubset of the first plurality of memory cells have at least a firstthreshold voltage; and (c) applying a second verify voltage, differentfrom the first verify voltage, to the word line to verify a secondsubset of the first plurality of memory cells have at least a secondthreshold voltage.

Example embodiments also include a method of programming a multi-bitnon-volatile memory cell comprising programming a first bit of data intothe memory cell so that the memory cell exhibits a characteristic withina first range, the exhibited characteristic representing the first bitof data; reading the first bit of data from the memory cell; determininga shift of the characteristic exhibited by the memory cell; andprogramming a the memory cell to store the first bit of data and asecond bit of data so that the memory cell exhibits a characteristicwithin a second range, the second range being chosen based upon thedetermined shift.

Example embodiments also include a method of programming a non-volatilememory cell comprising altering a threshold voltage of a memory celltransistor to within a first range; determining a shift of the thresholdvoltage of the memory cell with respect to the first range; altering thethreshold voltage of the memory cell transistor to a second range, thesecond range selected in response to the determining step.

Example embodiments also include a non-volatile memory device comprisingan array of memory cells arranged in rows in columns, rows of memorycells connected to corresponding word lines, columns of memory cellsconnected to corresponding bit lines; a page buffer including datalatches and second latches connected to corresponding bit lines, datalatches configured to store data; a voltage generator configured togenerate a program voltage; a row decoder configured to decode anaddress and select a word line; a control unit configured to control aprogramming operation including performing a plurality of program loopseach program loop comprising application of a program pulse to a wordline selected by the row decoder and a plurality of sequential verifyoperations to verify respective program levels of a first row of memorycells connected to the selected word line, wherein the data latches ofthe page buffer are configured to inhibit or allow a programmingoperation on respective memory cells of the first row connected to bitlines corresponding to the data latches, and wherein the second latchesare configured to select one of a plurality of verify resultscorresponding to each of the plurality of verify operations of a programloop.

Example embodiments also include non-volatile memory device comprisingan array of memory cells arranged in rows in columns, rows of memorycells connected to corresponding word lines, columns of memory cellsconnected to corresponding bit lines; a voltage generator configured togenerate a program voltage; a page buffer including data latches andsecond latches connected to corresponding bit lines, data latchesconfigured to temporarily store data to be stored in a row of memorycells to be programmed; a row decoder configured to decode an addressand select a word line; a control unit configured to control aprogramming operation including performing a plurality of program loopseach program loop comprising application of a program pulse to a wordline selected by the row decoder and a plurality of sequential verifyoperations to verify respective voltage threshold levels of a first rowof memory cells connected to the selected word line; wherein the datalatches of the page buffer are configured to inhibit or allow aprogramming operation on respective memory cells of the first rowconnected to bit lines corresponding to the data latches, wherein thecontrol unit is configured control a coarse programming operation toprogram the first row of memory cells to a plurality of coarse programstate, each of the plurality of coarse program states corresponding to afine program state, wherein the control unit is configured to perform astate read of the first row of the memory cells when in a coarse programstate to determine a tendency of a threshold voltage of each memory cellto shift, and wherein the second latches are configured to storeinformation of the result of the state read, and configured to select,in response to the information stored in the second latches, one of aplurality of verify results corresponding to each of the plurality ofverify operations of a program loop.

Example embodiments also contemplate devices implementing the disclosedmethods described herein, as well as operation methods of the devicesdescribed herein.

BRIEF DESCRIPTION OF THE FIGURES

The above and other objects and features will become apparent from thefollowing description with reference to the following figures, whereinlike reference numerals refer to like parts throughout the variousfigures unless otherwise specified, and wherein

FIG. 1 is a block diagram schematically illustrating a nonvolatilememory device according to an embodiment.

FIG. 2 is a diagram illustrating a memory cell array in FIG. 1 accordingto an embodiment.

FIG. 3 is a top view of a part of one memory block in FIG. 1 accordingto an embodiment.

FIG. 4 is a perspective view taken along a line IV-IV′ in FIG. 3according to an embodiment.

FIG. 5 is a cross-sectional view taken along a line IV-IV′ in FIG. 3according to an embodiment.

FIG. 6 is an enlarged diagram illustrating one of cell transistors inFIG. 5.

FIG. 7 is a circuit diagram illustrating an equivalent circuit of a partEC of a top view in FIG. 3 according to an embodiment.

FIGS. 8A-8D illustrate exemplary charge rearrangement phenomena.

FIG. 9 is a flowchart for describing a program method according to anembodiment.

FIG. 10 is a diagram illustrating threshold voltage distributions ofmemory cells when LSB data is programmed into memory cells.

FIG. 11 is a flowchart for fully describing an operation S150 ofperforming a state read operation in FIG. 9.

FIG. 12 is a diagram illustrating a method of performing a state readoperation in FIG. 11.

FIG. 13 is a flowchart for fully describing an operation S160 ofprogramming memory cells with program data in FIG. 9.

FIG. 14 is a diagram illustrating threshold voltage distributions ofmemory cells programmed according to a program method in FIG. 13.

FIG. 15 is a diagram illustrating a threshold voltage variation due tocharge rearrangement that is generated at memory cells programmedaccording to a method described in FIG. 14.

FIG. 16 is a timing diagram illustrating voltages applied to a selectedword line according to a program method described in FIG. 14.

FIG. 17 is a timing diagram illustrating voltages applied to a selectedword line according to a program method described in FIGS. 13 and 14.

FIG. 18 is a diagram illustrating an application of threshold voltagedistributions of memory cells programmed according to a program methodin FIG. 13.

FIG. 19 is a diagram illustrating another application of thresholdvoltage distributions of memory cells programmed according to a programmethod in FIG. 13.

FIG. 20 is a block diagram schematically illustrating a nonvolatilememory device according to still another embodiment.

FIG. 21 is a flowchart illustrating a program method according toanother embodiment.

FIG. 22A is a diagram illustrating threshold voltage distributions ofmemory cells according to a program method in FIG. 21. FIG. 22Billustrates an alternative, which may be applied to the embodiment ofFIG. 22A.

FIG. 23 is a block diagram schematically illustrating a nonvolatilememory device according to still another embodiment.

FIG. 24 is a flowchart illustrating a program method according to stillanother embodiment.

FIG. 25 is a block diagram schematically illustrating a nonvolatilememory device according to still another embodiment.

FIG. 26 is a flowchart illustrating a program method according to stillanother embodiment.

FIG. 27 is a flowchart illustrating a program method according to stillanother embodiment.

FIG. 28 is a flowchart illustrating a program method according to stillanother embodiment.

FIG. 29 is a flowchart illustrating a program method according to stillanother embodiment.

FIG. 30A is a timing diagram illustrating voltages applied to a selectedword line according to a program method in FIG. 29.

FIG. 30B is a graph illustrating a variation in a threshold voltagedistribution of memory cells according to a program method in FIG. 29and a voltage applying manner in FIG. 30A.

FIG. 31 is a circuit diagram illustrating an equivalent circuit of apart EC of a top view in FIG. 3 according to another embodiment.

FIG. 32 is a circuit diagram illustrating an equivalent circuit of apart EC of a top view in FIG. 3 according to still another embodiment.

FIG. 33 is a circuit diagram illustrating an equivalent circuit of apart EC of a top view in FIG. 3 according to still another embodiment.

FIG. 34 is a circuit diagram illustrating an equivalent circuit of apart EC of a top view in FIG. 3 according to still another embodiment.

FIG. 35 is a circuit diagram illustrating an equivalent circuit of apart EC of a top view in FIG. 3 according to still another embodiment.

FIG. 36 is a circuit diagram illustrating an equivalent circuit of apart EC of a top view in FIG. 3 according to still another embodiment.

FIG. 37 is a perspective view taken along a line IV-IV′ in FIG. 3according to another embodiment.

FIG. 38 is a cross-sectional view taken along a line IV-IV′ in FIG. 3according to another embodiment.

FIG. 39 is a perspective view taken along a line IV-IV′ in FIG. 3according to still another embodiment.

FIG. 40 is a cross-sectional view taken along a line IV-IV′ in FIG. 3according to still another embodiment.

FIG. 41 is a perspective view taken along a line IV-IV′ in FIG. 3according to still another embodiment.

FIG. 42 is a cross-sectional view taken along a line IV-IV′ in FIG. 3according to still another embodiment.

FIG. 43 is a top view illustrating one memory block in FIG. 2 accordingto another exemplary embodiment.

FIG. 44 is a perspective view taken along a line X X X X IV-X X X X IV′in FIG. 43.

FIG. 45 is a cross-sectional view taken along a line X X X X IV-X X X XIV′ in FIG. 43.

FIG. 46 is a top view illustrating a part of one memory block in FIG. 2according to still another embodiment.

FIG. 47 is a perspective view taken along a line X X X X VII-X X X XVII′ in FIG. 46.

FIG. 48 is a cross-sectional view taken along a line X X X X VII-X X X XVII′ in FIG. 46.

FIG. 49 is a top view illustrating a part of one memory block in FIG. 2according to still another embodiment.

FIG. 50 is a perspective view taken along a line X X X X X-X X X X X′ inFIG. 49.

FIG. 51 is a top view illustrating a part of one memory block in FIG. 2according to still another embodiment.

FIG. 52 is a perspective view taken along a line X X X X X II-X X X X XII′ in FIG. 51.

FIG. 53 is a cross-sectional view taken along a line X X X X X II-X X XX X II′ in FIG. 51.

FIG. 54 is a plane view illustrating a part of one memory block in FIG.2 according to still another embodiment.

FIG. 55 is a perspective view taken along a line X X X X X V-X X X X XV′ in FIG. 54.

FIG. 56 is a cross-sectional view taken along a line X X X X X V-X X X XX V′ in FIG. 54.

FIG. 57 is a circuit diagram illustrating an equivalent circuit of apart EC of a top view in FIG. 54 according to an embodiment.

FIG. 58 is a perspective view taken along a line X X X X X V-X X X X XV′ in FIG. 54.

FIG. 59 is a cross-sectional view taken along a line X X X X X V-X X X XX V′ in FIG. 54.

FIG. 60 is a circuit diagram illustrating an equivalent circuit of apart EC of a top view in FIG. 54 according to another embodiment.

FIG. 61 is a block diagram illustrating a memory system according to anembodiment.

FIG. 62 is a flowchart for describing a program method of a memorysystem according to an embodiment.

FIG. 63 is a flowchart for describing a state read method of a memorysystem according to an embodiment.

FIG. 64 is a block diagram illustrating an application of a memorysystem in FIG. 61.

FIG. 65 is a diagram illustrating a memory card according to anembodiment.

FIG. 66 is a diagram illustrating a solid state drive according to anembodiment.

FIG. 67 is a block diagram illustrating a computing system according toan embodiment.

DETAILED DESCRIPTION

Various example embodiments will be described more fully hereinafterwith reference to the accompanying drawings, in which some exampleembodiments are shown. The present invention may, however, be embodiedin many different forms and should not be construed as limited to theexample embodiments set forth herein. These example embodiments are justthat—examples—and many implementations and variations are possible thatdo not require the details provided herein. It should also be emphasizedthat the disclosure provides details of alternative examples, but suchlisting of alternatives is not exhaustive. Furthermore, any consistencyof detail between various examples should not be interpreted asrequiring such detail—it is impracticable to list every possiblevariation for every feature described herein. The language of the claimsshould be referenced in determining the requirements of the invention.In the drawings, the size and relative sizes of layers and regions maybe exaggerated for clarity. Like numbers refer to like elementsthroughout.

It will be understood that, although the terms first, second, third etc.may be used herein to describe various elements, components, regions,layers and/or sections, these elements, components, regions, layersand/or sections should not be limited by these terms. These terms areonly used to distinguish one element, component, region, layer orsection from another region, layer or section. Thus, a first element,component, region, layer or section discussed below could be termed asecond element, component, region, layer or section without departingfrom the teachings.

Spatially relative terms, such as “beneath”, “below”, “lower”, “under”,“above”, “upper” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. It will beunderstood that the spatially relative terms are intended to encompassdifferent orientations of the device in use or operation in addition tothe orientation depicted in the figures. For example, if the device inthe figures is turned over, elements described as “below” or “beneath”or “under” other elements or features would then be oriented “above” theother elements or features. Thus, the exemplary terms “below” and“under” can encompass both an orientation of above and below. The devicemay be otherwise oriented (rotated 90 degrees or at other orientations)and the spatially relative descriptors used herein interpretedaccordingly. In addition, it will also be understood that when a layeris referred to as being “between” two layers, it can be the only layerbetween the two layers, or one or more intervening layers may also bepresent.

The terminology used herein is for the purpose of describing particularembodiments only and is not intended to be limiting. As used herein, thesingular forms “a”, “an” and “the” are intended to include the pluralforms as well, unless the context clearly indicates otherwise. It willbe further understood that the terms “comprises,” “comprising,”“includes,” “including,” “have,” “having,” etc., when used in thisspecification, specify the presence of stated features, integers, steps,operations, elements, and/or components, but do not preclude thepresence or addition of one or more other features, integers, steps,operations, elements, components, and/or groups thereof. As used herein,the term “and/or” includes any and all combinations of one or more ofthe associated listed items.

It will be understood that when an element or layer is referred to asbeing “on”, “connected to”, “coupled to”, or “adjacent to” anotherelement or layer, it can be directly on, connected, coupled, or adjacentto the other element or layer, or intervening elements or layers may bepresent. In contrast, when an element is referred to as being “directlyon,” “directly connected to”, “directly coupled to”, or “immediatelyadjacent to” another element or layer, there are no intervening elementsor layers present.

Unless otherwise defined, all terms (including technical and scientificterms) used herein have the same meaning as commonly understood by oneof ordinary skill in the art to which this inventive concept belongs. Itwill be further understood that terms, such as those defined in commonlyused dictionaries, should be interpreted as having a meaning that isconsistent with their meaning in the context of the relevant art and/orthe present specification and will not be interpreted in an idealized oroverly formal sense unless expressly so defined herein.

The term “selected memory block” may be used to indicate a memory block,selected for an operation, such as programming, erasing, or reading,from among a plurality of memory blocks. The term “selected sub block”may be used to indicate a sub block, selected for an operation, such asprogramming, erasing, or reading, from among a plurality of sub blocksin one memory block.

The term “selected bit line” or “selected bit lines” may be used toindicate a bit line or bit lines, connected with a cell transistor to beprogrammed or read, from among a plurality of bit lines. The term“unselected bit line” or “unselected bit lines” may be used to indicatea bit line or bit lines, connected with a cell transistor to beprogram-inhibited or read-inhibited, from among a plurality of bitlines.

The term “selected string selection line” may be used to indicate astring selection line, connected with a cell string including a celltransistor to be programmed or read, from among a plurality of stringselection lines. The term “unselected string selection line” or“unselected string selection lines” may be used to indicate a remainingstring selection line or remaining string selection lines other than theselected string selection line from among a plurality of stringselection lines. The term “selected string selection transistors” may beused to indicate string selection transistors connected with a selectedstring selection line. The term “unselected string selectiontransistors” may be used to indicate string selection transistorsconnected with an unselected string selection line or unselected stringselection lines.

The term “selected ground selection line” may be used to indicate aground selection line, connected with a cell string including a celltransistor to be programmed or read, among a plurality of groundselection lines. The term “unselected ground selection line” may be usedto indicate a remaining ground selection line or remaining groundselection lines other than the selected ground selection line from amonga plurality of ground selection lines. The term “selected groundselection transistors” may be used to indicate ground selectiontransistors connected with a selected ground selection line. The term“unselected ground selection transistors” may be used to indicate groundselection transistors connected with an unselected ground selection lineor unselected ground selection lines.

The term “unselected word line” may be used to indicate a word line,connected with a cell transistor to be programmed or read, from among aplurality of word lines. The term “unselected word line” or “unselectedword lines” may be used to indicate a remaining word lines or remainingword lines other than a selected word line from among a plurality ofword lines.

The term “selected memory cell” or “selected memory cells” may be usedto designate memory cells to be programmed or read among a plurality ofmemory cells. The term “unselected memory cell” or “unselected memorycells” may be used to indicate a remaining memory cell or remainingmemory cells other than a selected memory cell or selected memory cellsfrom among a plurality of memory cells.

Embodiments will be described with reference to a NAND flash memory.However, the inventive concept is not limited thereto. The inventiveconcept may be applied to other non-volatile and volatile memory types,such as Electrically Erasable and Programmable ROM (EEPROM), NOR flashmemory, Phase-change RAM (PRAM), Magnetic RAM (MRAM), Resistive RAM(RRAM), Ferroelectric RAM (FRAM), and the like.

FIG. 1 is a block diagram schematically illustrating a nonvolatilememory device according to an embodiment. Referring to FIG. 1, anonvolatile memory device 100 may include a memory cell array 110, anaddress decoding unit 120, a page buffer unit 130, a data input/outputunit 140, a voltage generating unit 150, and a control unit 160.

The memory cell array 100 may include a plurality of cell strings thatare arranged on a substrate in an array fashion, the array extending ina row direction and a column direction. Each cell string may include aplurality of memory cells stacked along a direction perpendicular to thesubstrate. That is, memory cells may be provided on the substratearrayed in rows and columns, and may be stacked in a directionperpendicular to the substrate to form a three-dimensional memory cellarray structure. The memory cell array 110 may include plural memorycells that store one or more bits of data, respectively. Alternativestructures are also possible, such as a two-dimensional memory cellarray.

The address decoding unit 120 may be coupled with the memory cell array110 via word lines WL, string selection lines SSL, and ground selectionlines GSL. The address decoding unit 120 may be configured to operateresponsive to the control of the control unit 160. The address decodingunit 120 may receive an address ADDR from an external device.

The address decoding unit 120 may be configured to decode a row addressof the input address ADDR. The address decoding unit 120 may beconfigured to select a word line, corresponding to the decoded rowaddress, from among the plurality of word lines WL. The address decodingunit 120 may be configured to select a string selection line and aground selection line, corresponding to the decoded row address, fromamong the string selection lines SSL and the ground selection lines GSL.

The address decoding unit 120 may supply the word lines WL with voltagestransferred from the voltage generating unit 150 in response to thedecoded row address and the control of the control unit 160. The addressdecoding unit 120 may supply the word lines WL with an upperverification voltage VFYU, a normal verification voltage VFYN, a lowerverification voltage VFYL, a normal state read voltage VSRN, an upperstate read voltage VSRU, a pass voltage VPASS, a program voltage VPGM, averification voltage VFY, a read voltage Vrd, and a non-selection readvoltage Vread selectively.

The address decoding unit 120 may be configured to decode a columnaddress among the input address ADDR. The address decoding unit 120 maytransfer the decoded column address DCA to the page buffer unit 130.

The page buffer unit 130 may be coupled with the memory cell array 110via the bit lines BL. The page buffer unit 130 may operate responsive tothe control of the control unit 160. The page buffer unit 130 mayreceive the decoded column address DCA from the address decoding unit120. The page buffer unit 130 may select the bit lines BL in response tothe decoded column address DCA.

The page buffer unit 130 may include a plurality of page buffers PB.Each page buffer PB may be coupled with one bit line BL. Each pagebuffer PB may include a data latch DL and a rearrangement latch RL.

Data to be programmed at memory cells and Data programmed at the memorycells may be stored in the data latches DL. For example, data previouslyprogrammed at memory cells and data to be programmed at the memory cellsmay be stored in the data latches DL.

Information associated with charge rearrangement of memory cells may bestored in the rearrangement latches RL. For example, a state read resultof memory cells may be stored in the rearrangement latches RL. This willbe more fully described later.

The address decoding unit 120 and the page buffer unit 130 may performprogram and read operations according to the control of the control unit160. Reading and programming on the memory cell array 110 may be made bycontrolling the string selection lines SSL, the word lines WL, and theground selection lines GSL via the address decoding unit 120 andcontrolling the bit lines BL via the page buffer unit 130. Atprogramming, a verification read operation may be carried out. The pagebuffer unit 130 may output the control unit 160 with a result of theverification read operation.

The page buffer unit 130 may receive data via data lines DL. The inputdata in the page buffer unit 130 may be written in the memory cell array110. The page buffer unit 130 may read data from the memory cell array110 to output it via the data lines DL. The page buffer unit 130 maystore data read out from a first storage area of the memory cell array110. The data stored in the page buffer unit 130 may be written in asecond storage area thereof. That is, a copy-back operation may be made.

The address decoding unit 120 and the page buffer unit 130 may perform astate read operation according to the control of the control unit 160.This will be more fully described later. The address decoding unit 120and the page buffer unit 130 may perform a program operation consideringrearrangement under the control of the control unit 160. This will bemore fully described later.

The data input/output unit 140 may be connected with the page bufferunit 130 via the data lines DL. The data input/output unit 140 may beconfigured to exchange data with an external device. The datainput/output unit 140 may output data transferred from the page bufferunit 130 via the data lines DL to the external device. The datainput/output unit 140 may transfer data input from the external deviceto the page buffer unit 130 via the data lines DL.

The voltage generating unit 150 may generate various voltages accordingto the control of the control unit 160. The voltage generating unit 150may generate an upper verification voltage VFYU, a normal verificationvoltage VFYN, a lower verification, a voltage VFYL, a normal state readvoltage VSRN, an upper state read voltage VSRU, a pass voltage VPASS, aprogram voltage VPGM, a verification voltage VFY, a read voltage Vrd,and a non-selection read voltage Vread. Each of these voltages may beare supplied to the address decoding unit 120.

The upper verification voltage VFYU, the normal verification voltageVFYN, and the lower verification voltage VFYL may be verificationvoltages used to program memory cells to one program state consideringcharge rearrangement.

The normal state read voltage VSRN and the upper state read voltage VSRUmay be read voltages used at a state read operation for detecting thecharge rearrangement.

Each of the upper verification voltage VFYU, the normal verificationvoltage VFYN, the lower verification voltage VFYL, the normal state readvoltage VSRN, and the upper state read voltage VSRU may be formed as aset of voltages. For example, the upper verification voltage VFYU mayindicate a set of voltages with various levels respectivelycorresponding to a Least Significant Bit (LSB), a Central SignificantBit (CSB), and a Most Significant Bit (MSB). These bits may also bereferred to by different names, such as Second Significant Bit (2SB). Ingeneral, use of these “significant bit” phrases are used in thisapplication to distinguish programming of various bits of informationinto the multi-level cell. Traditionally, flash memory programming haslabeled a first bit to be programmed into a multi-level cell (from theerase state) as a Least Significant Bit (LSB) and the last bit ofinformation to be programmed into a multi-level cell as a MostSignificant Bit (MSB). When the multi-level cell has more than two bits,intermediate bits may be referred to as a Central Significant Bit (CSB),Second Significant Bit (2SB), etc. For ease of explanation, thisapplication describes programming in a like fashion. It should beemphasized, however, that the significance of the bit of information isnot dependent on the order of storage in the multi-level cell withrespect to other bits. The significance of the bits with respect to eachother, if any, may be determined by their use by a user, by later datahandling by the memory device (e.g., by I/O circuitry of the memorydevice) or external devices (e.g., a memory controller). Thus, datareferenced as LSB data may in fact be treated downstream as MSB data,and MSB data may be in fact LSB data. Each of the normal verificationvoltage VFYN, the lower verification voltage VFYL, the normal state readvoltage VSRN, and the upper state read voltage VSRU may indicate a setof voltages with various levels. A specific voltage of a set of voltagesmay be marked by a reference numeral following a reference symbol.

The pass voltage VPASS, the program voltage VPGM, the verificationvoltage VFY, the read voltage Vrd, and the non-selection read voltageVread may be voltages used at programming and reading.

The control unit 160 may be configured to control an overall operationof the nonvolatile memory device 100. The control unit 160 may operateresponsive to control signals CTRL and a command CMD that are providedfrom an external device. The control unit 160 may judge program pass orprogram fail based on a verification read result provided from the pagebuffer unit 130. The control unit 160 may control the nonvolatile memorydevice 100 so as to perform program, read, erase, state read, andrearrangement program operations.

The control unit 160 may include a rearrangement controller 161. Therearrangement controller 161 may control a state read operation fordetecting (or, predicting) a charge rearrangement characteristic of aprogrammed memory cell and a program operation considering rearrangementaccording to a state read result.

FIG. 2 is a diagram illustrating a memory cell array in FIG. 1 accordingto an embodiment. Referring to FIGS. 1 and 2, a memory cell array 110may include a plurality of memory blocks BLK1 to BLKz. In this example,each of the memory blocks BLK1 to BLKz may have a three-dimensionalmemory cell array structure (or, a vertical memory cell arraystructure). For example, each of the memory blocks BLK1 to BLKz mayinclude memory cells arrays extending in the first, second and thirddirections. Although not shown in FIG. 2, each of the memory blocks BLK1to BLKz may include a plurality of cell strings extending along thesecond direction. Although not shown in FIG. 2, a plurality of cellstrings may be spaced apart from one other along the first and thirddirections.

Cell strings (not shown) within one memory block may be coupled with aplurality of bit lines BL, a plurality of string selection lines SSL, aplurality of word lines WL, one or more ground selection lines GSL, anda common source line. Cell strings in the plurality of memory blocksBLK1 to BLKz may share a plurality of bit lines. For example, theplurality of bit lines may extend along the second direction so as to beshared by the plurality of memory blocks BLK1 to BLKz.

The plurality of memory blocks BLK1 to BLKz may be selected by anaddress decoding unit 120 in FIG. 1. For example, the address decodingunit 120 may be configured to select a memory block, corresponding to aninput address ADDR, from among the plurality of memory blocks BLK1 toBLKz. Erasing, programming, and reading on a selected memory block maybe made. The plurality of memory blocks BLK1 to BLKz will be more fullydescribed with reference to FIGS. 3 to 6.

FIG. 3 is a top view of a part of one memory block in FIG. 1 accordingto an embodiment. FIG. 4 is a perspective view taken along a line IV-IV′in FIG. 3 according to an embodiment. FIG. 5 is a cross-sectional viewtaken along a line IV-IV′ in FIG. 3 according to an embodiment.

Referring to FIGS. 3 to 5, three-dimensional memory cell arraysextending along first to third directions may be provided.

A substrate 111 may be provided. The substrate 111 may be a well havinga first conductivity type, for example. The substrate 111 may be ap-well in which the Group III element such as boron is injected. Thesubstrate 111 may be a pocket p-well that is provided within an n-well.Below, it is assumed that the substrate 111 is a p-well (or, a pocketp-well). However, the substrate 111 is not limited to p-type.

A plurality of common source regions CSR extending along the firstdirection may be provided in the substrate 111. The common sourceregions CSR may be spaced apart from one another along the seconddirection. The common source regions CSR may be connected in common toform a common source line.

The common source regions CSR may have a second conductivity typedifferent from that of the substrate 111. For example, the common sourceregions CSR may be n-type. Below, it is assumed that the common sourceregions CSR are the n-type. However, the common source regions CSR arenot limited to the n-type.

Between two adjacent regions of the common source regions CSR, aplurality of insulation materials 112 and 112 a may be providedsequentially on the substrate 111 along the third direction (i.e., adirection perpendicular to the substrate 111). The insulation materials112 and 112 a may be spaced apart along the third direction. Theinsulation materials 112 and 112 a may extend along the first direction.For example, the insulation materials 112 and 112 a may include aninsulation material such as a semiconductor oxide film. The insulationmaterial 112 a contacting with the substrate 111 may be thinner inthickness than other insulation materials 112.

Between two adjacent regions of the common source regions CSR, aplurality of pillars PL may be arranged sequentially along the firstdirection so as to penetrate the plurality of insulation materials 112and 112 a along the second direction. For example, the pillars PL maycontact with the substrate 111 through the insulation materials 112 and112 a.

In an embodiment, the pillars PL between two adjacent common sourceregions CSR may be spaced apart along the first direction. The pillarsPL may be disposed in line along the first direction.

In an embodiment, the pillars PL may be formed of a plurality ofmaterials, respectively. Each of the pillars PL may include a channelfilm 114 and an inner material 115 provided within the channel film 114.

The channel films 114 may include a semiconductor material (e.g.,silicon) having a first conductivity type. For example, the channelfilms 114 may include a semiconductor material (e.g., silicon) havingthe same type as the substrate 111. The channel films 114 can includeintrinsic semiconductor being a nonconductor.

The inner materials 115 may include an insulation material. For example,the inner materials 115 may include an insulation material such assilicon oxide. Alternatively, the inner materials 115 may include airgap.

Between two adjacent regions of the common source regions CSR,information storage films 116 may be provided on exposed surfaces of theinsulation materials 112 and 112 a and the pillars PL. The informationstorage films 116 may store information by trapping or dischargingcharges.

Between two adjacent common source regions CSR and between theinsulation materials 112 and 112 a, conductive materials CM1 to CM8 maybe provided on exposed surfaces of the information storage films 116.The conductive materials CM1 to CM8 may extend along the firstdirection. The conductive materials CM1 to CM8 on the common sourceregions CSR may be separated by word line cuts. The common sourceregions CSR may be exposed by the word line cuts. The word line cuts mayextend along the first direction.

In an embodiment, the conductive materials CM1 to CM8 may include ametallic conductive material. The conductive materials CM1 to CM8 mayinclude a nonmetallic conductive material such as polysilicon.

In an embodiment, information storage films 116 provided on an uppersurface of an insulation material placed at the uppermost layer amongthe insulation materials 112 and 112 a can be removed. Exemplarily,information storage films, provided at sides opposite to the pillars PL,from among sides of the insulation materials 112 and 112 a can beremoved.

A plurality of drains 320 may be provided on the plurality of pillarsPL, respectively. The drains 320 may include a semiconductor material(e.g., silicon) having a second conductivity type, for example. Thedrains 320 may include an n-type semiconductor material (e.g., silicon).Below, it is assumed that the drains 320 include n-type silicon.However, the prevent invention is not limited thereto. The drains 320can be extended to the upside of the channel films 114 of the pillarsPL.

Bit lines BL extending in the second direction may be provided on thedrains 320 so as to be spaced apart from one another along the firstdirection. The bit lines BL may be coupled with the drains 320. In thisembodiment, the drains 320 and the bit lines BL may be connected viacontact plugs (not shown). The bit lines BL may include a metallicconductive material. Alternatively, the bit lines BL may include anonmetallic conductive material such as polysilicon.

Below, the conductive materials CM1 to CM8 may have first height to theeighth height according to a distance from the substrate 111.

The plurality of pillars PL may form a plurality of cell stringstogether with the information storage films 116 and the plurality ofconductive materials CM1 to CM8. Each of the pillars PL may form a cellstring with information storage films 116 and adjacent conductivematerials CM1 to CM8.

The pillars PL may be provided on the substrate 111 along row and columndirections. The eighth conductive materials CM8 may constitute rows.Pillars connected with the same eighth conductive material CM8 mayconstitute one row. The bit lines BL may constitute columns. Pillarsconnected with the same bit line BL may constitute a column. The pillarsPL may constitute a plurality of strings arranged along row and columndirections together with the information storage films 116 and theplurality of conductive materials CM1 to CM8. Each cell string mayinclude a plurality of cell transistors CT stacked in a directionperpendicular to the substrate 111.

FIG. 6 is an enlarged diagram illustrating one of cell transistors inFIG. 5. Referring to FIGS. 3 to 6, cell transistors CT may be formed ofconductive materials CM1 to CM8, pillars PL, and information storagefilms 116 provided between the conductive materials CM1 to CM8 and thepillars PL.

The information storage films 116 may extend to upper surfaces and lowersurfaces of the conductive materials CM1 to CM8 from regions between theconductive materials CM1 to CM8 and the pillars PL. Each of theinformation storage films 116 may include first to third sub insulationfilms 117, 118, and 119.

In the cell transistors CT, the channel films 114 of the pillars PL mayinclude the same p-type silicon as the substrate 111. The channel films114 may act as bodies of cell transistors CT. The channel films 114 maybe formed in a direction perpendicular to the substrate 111. The channelfilms 114 of the pillars PL may act as a vertical body. Verticalchannels may be formed at the channel films 114.

The first sub insulation films 117 adjacent to the pillars PL may act astunneling insulation films of the cell transistors CT. For example, thefirst sub insulation films 117 may include a thermal oxide film,respectively. The first sub insulation films 117 may include a siliconoxide film, respectively.

The second sub insulation films 118 may act as charge storage films ofthe cell transistors CT. For example, the second sub insulation films118 may act as a charge trap film, respectively. For example, the secondsub insulation films 118 may include a nitride film or a metal oxidefilm, respectively.

The third sub insulation films 119 adjacent to the conductive materialsCM1 to CM8 may act as blocking insulation films of the cell transistorsCT. In this embodiment, the third sub insulation films 119 may be formedof a single layer or multiple layers. The third sub insulation films 119may be a high dielectric film (e.g., an aluminum oxide film, a hafniumoxide film, etc.) having a dielectric constant larger than those of thefirst and second sub insulation films 117 and 118. The third subinsulation films 119 may include a silicon oxide film, respectively.

In this embodiment, the first to third sub insulation films 117 to 119may constitute ONA (oxide-nitride-aluminum-oxide) or ONO(oxide-nitride-oxide).

The plurality of conductive materials CM1 to CM8 may act as a gate (or,a control gate), respectively.

That is, the plurality of conductive materials CM1 to CM8 acting asgates (or, control gates), the third sub insulation films 119 acting asblock insulation films, the second sub insulation films 118 acting ascharge storage films, the first sub insulation films 117 acting astunneling insulation films, and the channel films 114 acting as verticalbodies may constitute a plurality of cell transistors CT stacked in adirection perpendicular to the substrate 111. Exemplarily, the celltransistors CT may be a charge trap type cell transistor.

The cell transistors CT can be used for different purposes according toheight. For example, among the cell transistors CT, cell transistorshaving at least one height and placed at an upper portion may be used asstring selection transistors. The string selection transistors may beconfigured to perform switching operations between cell strings and bitlines. Among the cell transistors CT, cell transistors having at leastone height and placed at a lower portion may be used as ground selectiontransistors. The ground selection transistors may be configured toperform switching operations between cell strings and a common sourceline formed of common source regions CSR. Cell transistors between celltransistors used as string and ground selection transistors may be usedas memory cells and dummy memory cells.

The conductive materials CM1 to CM8 may extend along the first directionto be connected with the plurality of pillars PL. The conductivematerials CM1 to CM8 may constitute conductive lines interconnectingcell transistors CT of the pillars PL. In this embodiment, theconductive materials CM1 to CM8 may be used as a string selection line,a ground selection line, a word line, or a dummy word line according tothe height.

Conductive lines interconnecting cell transistors used as stringselection transistors may be used as string selection lines. Conductivelines interconnecting cell transistors used as ground selectiontransistors may be used as ground selection lines. Conductive linesinterconnecting cell transistors used as memory cells may be used asword lines. Conductive lines interconnecting cell transistors used asdummy memory cells may be used as dummy word lines.

FIG. 7 is a circuit diagram illustrating an equivalent circuit of a partEC of a top view in FIG. 3 according to an embodiment. Referring toFIGS. 3 to 7, cell strings CS11, CS12, CS21, and CS22 may be providedbetween bit lines BL1 and BL2 and a common source line CSL. Cell stringsCS11 and CS21 may be connected between the first bit line BL1 and thecommon source line CSL, and cell strings CS12 and CS22 may be connectedbetween the second bit line BL2 and the common source line CSL.

Common source regions CSR may be connected in common to form a commonsource line CSL.

The cell strings CS11, CS12, CS21, and CS22 may correspond to fourpillars of a part EC of a top view in FIG. 3. The four pillars mayconstitute four cell strings CS11, CS12, CS21, and CS22 together withconductive materials CM1 to CM8 and information storage films 116.

In this embodiment, the first conductive materials CM1 may constituteground selection transistors GST with the information storage films 116and the pillars PL. The first conductive materials CM1 may form a groundselection line GSL. The first conductive materials CM1 may beinterconnected to form a ground selection line GSL.

The second to seventh conductive materials CM2 to CM7 may constitutefirst to sixth memory cells MC1 to MC6 with the information storagefilms 116 and the pillars PL. The second to seventh conductive materialsCM2 to CM7 may be used as second to sixth word lines WL2 to WL6.

The second conductive material CM2 may be interconnected to form thefirst word line WL1. The third conductive material CM3 may beinterconnected to form the second word line WL2. The fourth conductivematerial CM4 may be interconnected to form the third word line WL3. Thefifth conductive material CM5 may be interconnected to form the fourthword line WL4. The sixth conductive material CM6 may be interconnectedto form the fifth word line WL5. The seventh conductive material CM7 maybe interconnected to form the sixth word line WL6.

The eighth conductive materials CM8 may constitute string selectiontransistors SST with the information storage films 116 and the pillarsPL. The eighth conductive materials CM8 may form string selection linesSSL1 and SSL2.

Memory cells of the same height may be connected in common with one wordline. Accordingly, when applied to a word line of a specific height, avoltage may be applied to all cell strings CS11, CS12, CS21, and CS22.

Cell strings in different rows may be connected with different stringselection lines SSL1 and SSL2, respectively. The cell strings CS11,CS12, CS21, and CS22 may be selected or unselected by the row byselecting or unselecting the string selection lines SSL1 and SSL2. Forexample, cell strings (CS11 and CS12) or (CS21 and CS22) connected withan unselected string selection line SSL1 or SSL2 may be electricallyseparated from the bit lines BL1 and BL2. Cell strings (CS21 and CS22)or (CS11 and CS12) connected with a selected string selection line SSL2or SSL1 may be electrically connected with the bit lines BL1 and BL2.

The cell strings CS11, CS12, CS21, and CS22 may be connected with thebit lines BL1 and BL2 by the column. The cell strings CS11 and CS21 maybe connected with the bit line BL1, and the cell strings CS12 and CS22may be connected with the bit line BL2. The cell strings CS11, CS12,CS21, and CS22 may be selected and unselected by the column by selectingand unselecting the bit lines BL1 and BL2.

FIG. 8A is a diagram of an exemplary memory cell transistor, showing aplurality of electrons e trapped in charge trapping layer 118′ under thegate of the memory cell transistor. The charge trapping layer 118′ maybe a nitride film or a metal oxide film. The charge trapping layer 118′is sandwiched between insulation films 119′ and 117′, which may besilicon oxide films, e.g. A channel of the memory cell transistor may beformed in layer 114′, which may be formed in or from a semiconductorsubstrate, such as a silicon germanium, gallium arsenide or indiumphosphide crystalline wafer.

FIG. 8B illustrates an exemplary Vth (voltage threshold) distributionrange R of a plurality of memory cell transistors immediately afterprogramming the plurality of memory cell transistors. The plurality ofmemory cell transistor cells may be connected to the same word line andmay be programmed simultaneously. The Vth distribution range R mayrepresent a value of a bit in SLC memory cell transistors (e.g., a “0”)or values of bits stored in MLC memory cell transistors (e.g., “0/1”).Other Vth distribution ranges (not shown) may represent other values ofa bit (for SLC memory cell transistors) or bits (for MLC memory celltransistors). The Vth range of FIG. 8B may extend from a program verifyvoltage VFY to a second voltage value VFY+Δ.

FIG. 8C illustrates an exemplary Vth distribution of the plurality ofmemory cell transistors after charge rearrangement within each memorycell transistor of the plurality of memory cell transistors. As shown bythe arrows in FIG. 8A, electrons within charge trapping layer 118′ maymove after initially being trapped in the charge trapping layer 118′during programming. Electrons that migrate downwards away from the gateand towards the channel (in layer 114′) may act to increase the voltagethreshold Vth of that memory cell transistor, and electrons that migratehorizontally (left or right in FIG. 8A) may act to decrease the voltagethreshold Vth of that memory cell transistor. Thus, voltage thresholdVth of a memory cell transistor may naturally increase or decreaseoutside of the voltage threshold range R after some period of time afterprogramming, despite being initially programmed to within range R. Forthe plurality of memory cell transistors discussed above with respect toFIG. 8B, an exemplary voltage threshold range after charge rearrangementis shown in FIG. 8C. As seen in 8C, the voltage threshold range aftercharge rearrangement is larger than range R of FIG. 8B, including memorycell transistors with voltage thresholds greater than range R (at C—anexample of “upper tail” or “over tail” memory cell transistors) andmemory cell transistors with voltage thresholds less than range R (atA—an example of “under tail” memory cell transistors). If marginsbetween adjacent Vth ranges representing different values of a bit (orbits) is small, such charge rearrangement may lead to incorrectinterpretation (or an inability to interpret) a threshold value of amemory cell transistor. For example, memory cell transistors at A or Cmay have voltage threshold values in a range associated with a differentdata bit value (or different values of bits).

FIG. 8D is an enlarged diagram of a right portion of a cell transistorin FIG. 6. Referring to FIG. 8D, there are illustrated informationstorage film 116 including first to third sub insulation films 117 to119, a fifth conductive material CM5, and a channel film 114.

When a cell transistor CT in FIGS. 6 and 8D is programmed, charges ofthe channel film 114 may pass through the first sub insulation film 117to be trapped by the second sub insulation film 118. As charges aretrapped by the second sub insulation film 118, a threshold voltage ofthe cell transistor CT may be adjusted.

Charges just trapped by the second sub insulation film 118 may be at anunstable state. Charge rearrangement may occur when trapped charges mayshift within the second sub insulation film 118 to reach a stable state.

Electric fields among the fifth conductive material CM5, the trappedcharges, and the channel film 114 may be varied before and after chargerearrangement. That is, a threshold voltage of the cell transistor CTmay be varied before and after charge rearrangement. Although the celltransistor CT is programmed to have a target threshold voltage, itsthreshold voltage may become higher or lower than the target thresholdvoltage due to the charge rearrangement.

Programming may be made considering the charge rearrangement to reduceor prevent the above-described problem.

FIG. 9 is a flowchart for describing a program method according to anembodiment. Referring to FIGS. 1, 7, and 9, in operation S110, programdata to be stored into memory cells may be received. For example,program data may be received. The received program data may be intendedto be stored in memory cells corresponding to a selected stringselection line and a selected word line. The program data may be firststored in data latches DL prior to storage in the memory cells.

In operation S120, whether the program data corresponds to MSBprogramming may be determined. If the program data is determined not tocorrespond to MSB programming, in operation S140, program data may bestored into the memory cells in a typical fashion. For example, theprogram data may be stored under the condition that charge rearrangementis not considered.

If the program data is determined to correspond to MSB programming, readoperations S130 and S150 may be performed prior to the MSB programmingin step S160. In operation S130, a read operation on the memory cellsmay be performed to determine an erase state and at least one programstate. For example, if the MSB programming is to program a word line ofmemory cells previously programmed with LSB data, a read operation onthe memory cells of this word line may be performed to determine the LSBdata of the word line. The LSB data of the memory cells may berepresented as an erase state (e.g., LSB data of “1”) and a programstate (e.g., LSB data of “0”). A read result may be stored in the datalatches DL.

In operation S150, a state read operation on at least one program statemay be performed using a plurality of state read voltages. For example,a state read operation on at least one program state of each memory cellmay be executed. In the example of MSB programming a word line of memorycells and reading LSB data of that word line in step S130, the stateread operation of S150 may perform one or more state reads of memorycells with LSB data of “0”, that is, those memory cells of the word linehaving been previously programmed during the LSB programming operation.A state read result may be stored in rearrangement latches RL.

In operation S160, the MSB program data may be programmed into thememory cells using a plurality of verification voltages with differentlevels, according to the state read result. For example, in the MSBprogramming, some of the memory cells of a word line may be targeted forshifting of a Vth level of the memory cells to a particular Vth range toindicate a particular MSB/LSB data (e.g., a Vth range indicating “0/0”data for LSB and MSB data). These “0/0” data memory cells may beprogrammed using different verification voltages.

The state read operation and the program operation responsive to thestate read result need not be limited to programming MSB data. The stateread operation and the program operation responsive to the state readresult can be also applied to program data that is not MSB data.

FIG. 10 is a diagram illustrating threshold voltage distributions ofmemory cells when LSB data is programmed into certain memory cells, suchas certain EEPROM memory cells, NOR flash memory cells and NAND flashmemory cells. In FIG. 10, a horizontal axis indicates a thresholdvoltage, and a vertical axis indicates the number of memory cells. Thememory cells represented may be memory cells connected to a word line ofthe memory array, such as a physical page of memory cells in a NANDflash memory.

Before LSB data is programmed, memory cells may be at an erase state E.In this embodiment and other embodiments described herein, the eraseoperation is not described, but may be any known operation. If thememory device is a flash memory device, the erase operation maysimultaneously erase a block of memory cells, lowering their thresholdvalues to an erase state E. If memory cells with the erase state E arethen programmed with LSB data, they may have either one of an erasestate and an LSB program state LP, respectively, depending on the LSBdata the memory cell is intended to store (e.g., an erase state mayrepresent “1” LSB data and the LSB program state LP may represent “0”LSB data). The memory cells programmed to the LSB program state LP maybe programmed to have a threshold voltage higher than a verificationvoltage VFY1.

Memory cells programmed to the LSB program state LP may experiencecharge rearrangement. The charge rearrangement may force thresholdvoltages of the memory cells to be varied. The threshold voltages of thememory cells may be varied by other mechanisms other than chargerearrangement, such as by charge leakage, read disturbance (e.g., chargeinjection due to reading) or by charge coupling with neighboring memorycells. This may mean that a threshold voltage distribution of memorycells having the LSB program state LP widens.

FIG. 11 is a flowchart providing exemplary details of operation S150 ofperforming a state read operation in FIG. 9. Referring to FIGS. 1, 9,and 11, in operation S151, program states of memory cells may be readusing a normal state read voltage to determine lower tail memory cells.For example, memory cells programmed to the LSB program state LP thatare read as memory cells having a threshold voltage lower than thenormal state read voltage may be judged to be the lower tail memorycells.

In operation S153, program states of memory cells may be read using anupper state read voltage to determine upper tail memory cells. Forexample, memory cells programmed to the LSB program state LP that areread as memory cells having a threshold voltage higher than the normalstate read voltage may be judged to be the upper tail memory cells. Theupper state read voltage may be higher in level than the normal stateread voltage.

In operation S155, a state read result may be stored in rearrangementlatches RL. The state read result may indicate which of the memory cellsprogrammed to the LSB program state LP are the lower tail memory cells,the upper tail memory cells and which are neither lower tail nor uppertail memory cells (e.g., normal memory cells).

FIG. 12 is a diagram illustrating an exemplary method of performing astate read operation of FIG. 11. Referring to FIGS. 1, 11, and 12, astate read operation may be performed for each program state (e.g., eachVth range representing data previously programmed into the memorycells). In FIG. 12, there is only one program state, LSB program stateLP, and thus this example describes the state read operation withrespect to the LSB program state LP.

A read voltage Vrd1 may be a voltage used to discriminate those memorycells having an erase state E from those memory cells having an LSBprogram state LP. For example, the read voltage Vrd1 may be applied tothe selected word line while unselected word lines have a pass voltageapplied thereto (to assure memory cell transistors connected to theunselected word lines are turned on). After or during a chargeapplication to bit lines respectively connected to the selected memorycells, the application of the read voltage Vrd1 to the selected wordline allows the charge (voltage) on a corresponding bit line to drain toground for those memory cells of the selected word line having athreshold voltage lower than Vrd1 (these memory cells being turned on),while those memory cells of the selected word line having a thresholdvoltage higher than Vrd1 remain off, keeping a charge on correspondingbit lines. Detection of the charge or voltage on a bit line maytherefore be used to determine a voltage threshold (Vth) level of acorresponding memory cell connected to the selected word line, and thusbe used to represent corresponding data.

A state read operation may be performed using a normal state readvoltage VSRN1. Those memory cells having an LSB program state LP andhaving a threshold voltage lower than the normal state read voltageVSRN1 may be judged to be lower tail memory cells LP_L.

A state read operation may be performed using an upper state readvoltage VSRU1. Those memory cells having an LSB program state LP andhaving a threshold voltage higher than the upper state read voltageVSRU1 may be judged to be upper tail memory cells LP_U. If there is noprogram state higher than LSB program state LP previously programmed inthe memory cells (e.g., the page or word line of memory cells), anymemory cell of the memory cells (e.g., of the page or word line ofmemory cells) having a threshold voltage higher than the upper stateread voltage VSRU1 may be judged to be upper tail memory cells LP_U.

Memory cells that have a threshold voltage higher than the normal stateread voltage VSRN1 and lower than the upper state read voltage VSRU1 maybe judged to be normal memory cells LP_N.

In an embodiment, the normal state read voltage VSRN1 and the upperstate read voltage VSRU1 can have levels corresponding to a range of athreshold voltage distribution of memory cells with the LSB programstate LP when no charge rearrangement is generated. The normal stateread voltage VSRN1 may have the same level as a verification voltageVFY1 (refer to FIG. 10) used when memory cells are programmed to havethe LSB program state LP. The upper state read voltage VSRU1 may have alevel equal to the upper end of the range of the LSB program state LP,which may be estimated during the design of the memory device, estimatedbased on testing similar memory devices or by testing the memory deviceduring a post manufacturing process, or periodically determined andadjusted by performing a series of incremental read operation on the LSBprogram state LP data shortly after programming during the life of thememory device (e.g., corresponding to the highest Vth of memory cellsprogrammed to the LSB program state LP immediately or shortly afterprogramming those memory cells).

The lower tail memory cells LP_L may have a threshold voltage levellower than the normal state read voltage VSRN1. That is, the lower tailmemory cells LP_L may be memory cells whose threshold voltages arelowered due to the charge rearrangement or other factors.

The upper tail memory cells LP_U may have a threshold voltage levelhigher than the upper state read voltage VSRU1. That is, the upper tailmemory cells LP_U may be memory cells whose threshold voltages becomehigher due to the charge rearrangement or other factors. As the stateread operation is executed, it is possible to determine the lower tailmemory cells LP_L whose threshold voltages are lowered due to the chargerearrangement and the upper tail memory cells LP_U whose thresholdvoltages become higher due to the charge rearrangement. That is, it ispossible to discriminate characteristics of threshold voltages of memorycells varied due to the charge rearrangement or other factors.

FIG. 13 is a flowchart for describing exemplary details of operationS160 of programming memory cells with program data in FIG. 9. Referringto FIGS. 1, 9, and 13, in operation S161, bit lines BL may be biased.For example, the bit lines BL may be biased according to data stored indata latches DL. For example, the bit lines BL may be biased accordingto program data and data previously stored in memory cells. In responseto a level of bias voltage applied to the bit lines (e.g., a logic highor logic low voltage), memory cells connected to the bit line may beselected for programming or prevented from being programmed. See, e.g.,U.S. Pat. No. 5,473,563 for exemplary biasing of bit lines to prevent orallow memory cells to be programmed in a programming step. U.S. Pat. No.5,473,563 is incorporated by reference for its teachings of flash memoryprogramming operations and related structure, as well as for providingexemplary detail regarding structure, layout and operations oftwo-dimensional NAND flash memory.

In operation S162, a program voltage VPGM may be supplied to a selectedword line, and a pass voltage VPASS may be supplied to unselected wordlines. The program voltage VPGM may be a voltage sufficient to enablethe Fowler-Nordheim tunneling to be generated at memory cells of theselected word line that are selected for programming (e.g., in responseto the bias voltage applied to the bit lines). The pass voltage VPASSmay be a voltage sufficient to turn on those memory cells associatedwith unselected word lines (e.g., memory cells of a memory cell stringthat are not connected to the selected word line) to form channels inthese memory cells.

In operations S163, S164, S165, S166, S167 and S168 verification of theprogramming of the memory cells of the selected word line is performedwith different verification voltages. The verification voltage used toverify programming depends on whether the memory cell was previouslydetermined to be an upper tail memory cell LP_U, a normal memory cellLP_N or a lower tail memory cell LP_L. In operation S163, a lowerverification voltage may be applied to the selected word line, and anon-selection read voltage may be applied to the unselected word lines.The lower verification voltage may be lower in level than a normalverification voltage. The non-selection read voltage may be a voltagesufficient to turn on those memory cells associated with unselected wordlines (e.g., memory cells of a memory cell string that are not connectedto the selected word line) to form channels in these memory cells.

In operation S164, a verification result may be stored in data latchesDL corresponding to upper tail memory cells LP_U. A lower verificationvoltage may be applied to the selected word line to verify programmingof the upper tail memory cells LP_U. In this example, lower verificationvoltage may not be used to verify normal memory cells LP_N and lowertail memory cells LP_L.

In operation S165, a normal verification voltage may be provided to theselected word line to verify programming of the normal memory cellsLP_N, and a non-selection read voltage may be provided to the unselectedword lines. The normal verification voltage may be higher than the lowerverification voltage and lower than an upper verification voltage. Inoperation S166, a verification result may be stored in data latches DLcorresponding to normal memory cells. In this example, the normalverification voltage may be used to verify the normal memory cells LP_N,while it may not be used to verify upper tail memory cells LP_U andlower tail memory cells LP_L.

In operation S167, an upper verification voltage may be applied to theselected word line, and a non-selection read voltage may be applied tothe unselected word lines. The upper verification voltage may be higherin level than the normal verification voltage. In operation S168, averification result may be stored in data latches DL corresponding tolower tail memory cells LP_L. That is, the upper verification voltagemay be used to verify the lower tail memory cells LP_L, while it may notbe used to verify normal memory cells LP_N and upper tail memory cellsLP_U.

In operation S169, program pass may be judged. The programming operationmay end when it is determined that all memory cells to be programmedhave been verified to be programmed to a Vth level past theircorresponding verification voltage (as described above with respect tosteps S163, S165 and S167) and as reflected by the results stored incorresponding data latches (as described above with respect to stepsS164, S166 and S168). The programming of the word line may thus end atstep S169, either completely for this data or for this data set (e.g.,“0/1”) and proceed to the next data set (e.g., “0/0”). If it isdetermined that some of the memory cells have not been programmed to aVth level past their corresponding verification level, the method mayreturn to the beginning and repeat the programming and verification.Steps S161 to S169 may be repeated until programming of all selectedmemory cells is confirmed by Step S169 (pass) or for a certain (e.g.,predetermined) number of times (which may indicate a failure ofprogramming of the word line, and may indicate a faulty set of memorycells or a “bad block” of memory cells needing replacement).

FIG. 14 is a diagram illustrating threshold voltage distributions ofmemory cells programmed according to a program method in FIG. 13. Inthis example, memory cells of a selected word line are to be programmedwith a second significant bit 2SB. Prior to programming the memory cellsof the selected word line with the second significant bit 2SB, thememory cells of the selected word line have been programmed with LSBleast significant bit data and either have an erase state E Vth(representing one binary logic value of LSB data, such as “1”) or havebeen programmed from the erase state E to the LSB program state LP(representing the other binary logic value of LSB data, such as “0”).

Referring to FIGS. 1, 9 and 14, memory cells with an LSB program stateLP may be programmed to a second program state P2 or a third programstate P3. Memory cells with an erase state E may maintain the erasestate E or may be programmed to a first program state P1. The resultingstates (erase state, and program states P1, P2 and P3) may eachrepresent two bits of data (LSB data and 2SB data). For example, theerase state, and program states P1, P2 and P3 states may respectivelyrepresent 2SB/LSB data bits as “1/1”, “0/1” “1/0” and “0/0”.

When programming 2SB data to cells previously programmed to the LSBprogram state LP by increasing a threshold voltage value of the memorycells to either the P2 program state or P3 program state, memory cellsLP_N with the LSB program state LP may be programmed to a second normalprogram state P2_N or a third normal program state P3_N using a normalverification voltage VFYN1 or VFYN2. Upper tail memory cells LP_U withthe LSB program state LP may be programmed to a second lower programstate P2_L or a third lower program state P3_L using a lowerverification voltage VFYL1 or VFYL2. Lower tail memory cells LP_L withthe LSB program state LP may be programmed to a second upper programstate P2_U or a third upper program state P3_U using an upperverification voltage VFYU1 or VFYU2. For each of these memory cells inthe LSB program state (LP_L, LP and LP_U), the 2SB data bit to beprogrammed into the memory cell may determine whether the memory cell isprogrammed to the second normal program state P2 (P2_U, P2_N or P2_L,respectively) or the third normal program state P3 (P3_U, P3_N or P3_L,respectively).

The second lower program state P2_L, the second normal program stateP2_N, and the second upper program state P2_U may constitute the secondprogram state P2. The third lower program state P3_L, the third normalprogram state P3_N, and the third upper program state P3_U mayconstitute the third program state P3.

The lower verification voltage VFYL1 or VFYL2 may be respectively lowerin level than the normal verification voltage VFYN1 or VFYN2, and theupper verification voltage VFYU1 or VFYU2 may be respectively higher inlevel than the normal verification voltage VFYN1 or VFYN2.

FIG. 15 is a diagram illustrating a threshold voltage variation due tocharge rearrangement which is generated at memory cells programmedaccording to a method described in FIG. 14. Referring to FIGS. 1, 9, and15, charge rearrangement may be generated at memory cells programmed tofirst to third program states P1 to P3.

Upper tail memory cells LP_U whose threshold voltages become higher bythe charge rearrangement may be programmed to a second or third lowerprogram state P2_L or P3_L. Upper tail memory cells LP_U had beenpreviously determined to have a charge rearrangement characteristicsresulting in a higher threshold voltage (Vth) of the memory cell aftercharge rearrangement (e.g., as determined by state read operationsdescribed herein, such as those described with respect to FIGS. 9-12).By programming upper tail memory cells LP_U to a lower range of thesecond or program state P2 or P3 (i.e., P2_L or P3_L), during futurecharge rearrangement with respect to these memory cells, thresholdvoltages of memory cells with the second or third lower program stateP2_L or P3_L may be increased, so that a threshold voltage distributionis varied towards a second or third normal program state P2_N or P3_N.

Lower tail memory cells LP_L whose threshold voltages are lowered by thecharge rearrangement may be programmed to a second or third upperprogram state P2_U or P3_U. Lower tail memory cells LP_L had beenpreviously determined to have a charge rearrangement characteristicsresulting in a lower threshold voltage (Vth) of the memory cell aftercharge rearrangement (e.g., as determined by state read operationsdescribed herein, such as those described with respect to FIGS. 9-12).By programming lower tail memory cells LP_L to a higher range of thesecond or program state P2 or P3 (i.e., P2_H or P3_H), during future thecharge rearrangement with respect to these memory cells, thresholdvoltages of memory cells with the second or third upper program stateP2_U or P3_U may be decreased, so that a threshold voltage distributionis varied towards the second or third normal program state P2_N or P3_N.

In this example, memory cells whose threshold voltages are increased dueto the charge rearrangement may be programmed using a verificationvoltage lower than a normal verification voltage. Memory cells whosethreshold voltages are decreased due to the charge rearrangement may beprogrammed using a verification voltage higher than the normalverification voltage. If programming is made using verification voltagesdetermined in consideration of charge rearrangement, a threshold voltagedistribution of memory cells may become narrower due to chargerearrangement which may improve data reliability, allow for smallermargins between program states and/or increase a number of programstates (or bits/cell) of the memory cells.

When memory cell are programmed with multi-bit data, reading may beperformed to determine the data previously stored in the memory cells.FIGS. 14 and 15 show read voltages of Vrd1, Vrd2, Vrd3 that may beapplied to a selected word line in a read operation to determine theprogram state (E, P1, P2 or P3) of memory cells connected to theselected word line and thus read the data of the memory cells. Dependingon the data to be read (e.g., LSB or MSB) one or more reads with one ormore of the read voltages Vrd1, Vrd2, Vrd3 may be necessary. In additionto the reading to determine the stored data, state read operations fordetermining charge rearrangement, Vth shifting, and/or upper and lowertail memory cells of each program state may be performed.

There is described the case that a state read operation of each programstate is performed using two state read voltages. However, the inventiveconcept is not limited thereto. For example, further granularity may bedesired in determining the tendency of a Vth of a memory cell to shift.In such a case, four state read voltages may be used to determine largeupper tail memory cells, small upper tail memory cells, normal memorycells, small lower tail memory cells and large lower tail memory cells(respectively representing memory cells with a tendency to have a largeVth increase, a relatively smaller Vth increase, little or no Vth shift,a small Vth decrease and a relatively larger Vth decrease). In thisexample, five verification voltages may be used during programmingcorresponding to this memory cell classification. Other modificationsare also contemplated. For example, if it is determined that Vth shiftsin one direction (higher or lower) may tend to be larger than in anotherdirection, more state read voltages may be used in that direction toclassify the memory cells than the other direction. Alternatively, stateread voltages may only be used to determine upper tail memory cells andno distinction may be made between lower tail memory cells and normalmemory cells. Alternatively, state read voltages may only be used todetermine upper tail memory cells and no distinction may be made betweenlower tail memory cells and normal memory cells.

FIG. 16 is a timing diagram illustrating voltages applied to a selectedword line according to a program method described in FIG. 14. In anembodiment, voltages used to program memory cells to a second programstate P2 are illustrated in FIG. 16. Referring to FIGS. 13, 14, and 16,a program voltage VPGM may be applied to a selected word line.Afterwards, a lower verification voltage VFYL1, a normal verificationvoltage VFYN1, and an upper verification voltage VFYU1 may besequentially applied to the selected word line. Applying of the programvoltage VPGM and the verification voltages VFYL1, VFYN1, and VFYU1 mayform one program loop.

After a program loop is executed, a control unit 160 of a nonvolatilememory device 100 (refer to FIG. 1) may judge program pass or programfail. Programming may be ended at program pass. In case of determining aprogram fail, a next program loop may be performed.

At the next program loop, a program voltage VPGM with an increased levelmay be applied. Afterwards, the verification voltages VFYL1, VFYN1, andVFYU1 may be sequentially applied. The program voltage VPGM may beincremented for each iteration of the program loops. Alternatively or inaddition, length of application of the program voltage VPGM may beincreased for each iteration of the program loops

Page buffers PB may select a valid verification voltage of theverification voltages VFYL1, VFYN1, and VFYU1 according to data storedin rearrangement latches RL (refer to FIG. 1). For example, when datastored in a rearrangement latch RL indicates an upper tail memory cell,the page buffer PB may select the lower verification voltage VFYL1 as avalid verification voltage, and may ignore other verification voltagesVFYN1 and VFYU1. For example, for upper tail memory cells, when theverification voltages VFYN1 and VFYU1 are applied, the page buffer PBmay bias a bit line such that a value of a data latch is not changed.

Likewise, when data stored in a rearrangement latch RL indicates anormal memory cell, the page buffer PB may select the normalverification voltage VFYN1 as a valid verification voltage, readoperations using other verification voltages VFYL1 and VFYU1 may beignored (or not performed). When data stored in a rearrangement latch RLindicates an upper tail memory cell, the page buffer PB may select thelower verification voltage VFYL1 as a valid verification voltage, andmay ignore (or not perform) read operations using other verificationvoltages VFYN1 and VFYUl.

FIG. 17 is a timing diagram illustrating voltages applied to a selectedword line according to a program method which may include the detailsdescribed in FIGS. 13 and 14. In an embodiment, there are illustratedvoltages used to program memory cells to second and third program statesP2 and P3. Referring to FIGS. 13, 14, and 17, a program voltage VPGM maybe applied to a selected word line. Afterwards, a lower verificationvoltage VFYL1, a normal verification voltage VFYN1, an upperverification voltage VFYUl, a lower verification voltage VFYL2, a normalverification voltage VFYN2, an upper verification voltage VFYU2 may besequentially applied to the selected word line. Applying of the programvoltage VPGM and the verification voltages VFYL1, VFYN1, VFYUl, VFYL2,VFYN2, and VFYU2 may form a program loop.

After the program loop is executed, a control unit 160 of a nonvolatilememory device 100 (refer to FIG. 1) may determine program pass orprogram fail. Programming may be terminated in case of program pass. Anadditional program loop may be executed in case of program fail. At anext program loop, the program voltage VPGM having an increased levelmay be applied to the selected word line. Afterwards, the verificationvoltages VFYL1, VFYN1, VFYU1, VFYL2, VFYN2, and VFYU2 may besequentially applied to the selected word line to verify programming ofcorresponding memory cells of the word line. A level of the programvoltage VPGM may be increased for each subsequent iteration of theprogram loops.

Page buffers PB may select a valid verification voltage according todata stored in data latches DL (refer to FIG. 1) and rearrangementlatches RL. For example, when data stored in a data latch DL indicates asecond program state P2, the page buffer PB may ignore verify readoperations using the verification voltages VFYL2, VFYN2, and VFYU2. Inthe event that data stored in a rearrangement latch RL points at a lowertail memory cell, the page buffer PB may select the upper verificationvoltage VFYU1 as a valid verification voltage and may ignore verify readoperations using the verification voltages VFYN1 and VFYU1. When anon-selection verification voltage is applied, the page buffer PB maybias a bit line BL such that data of the data latch DL is not varied.

If data stored in the data latch DL indicates the second program stateP2 and data stored in the rearrangement latch RL points at a normalmemory cell, the page buffer PB may select the normal verificationvoltage VFYN1 as a valid voltage and may ignore verify read operationsusing the verification voltages VFYL1, VFYU1, VFYL2, VFYN2, and VFYU2.

In the event that data stored in the data latch DL indicates the secondprogram state P2 and data stored in the rearrangement latch RL points atan upper tail memory cell, the page buffer PB may select the lowerverification voltage VFYL1 as a valid voltage and may ignore verify readoperations using the verification voltages VFYN1, VFYU1, VFYL2, VFYN2,and VFYU2.

When data stored in the data latch DL indicates a third program state P3and data stored in the rearrangement latch RL points at a lower tailmemory cell, the page buffer PB may select the upper verificationvoltage VFYU2 as a valid voltage and may ignore verify read operationsusing the verification voltages VFYL1, VFYN1, VFYU1, VFYL2, and VFYN.

If data stored in the data latch DL indicates the third program state P3and data stored in the rearrangement latch RL points at a normal memorycell, the page buffer PB may select the normal verification voltageVFYN2 as a valid voltage and may ignore verify read operations using theverification voltages VFYL1, VFYN1, VFYU1, VFYL2, and VFYU2.

In case that data stored in the data latch DL indicates the thirdprogram state P3 and data stored in the rearrangement latch RL points atan upper tail memory cell, the page buffer PB may select the lowerverification voltage VFYL2 as a valid voltage and may ignore verify readoperations using the verification voltages VFYL1, VFYN1, VFYU1, VFYN2,and VFYU2.

FIG. 18 is a diagram illustrating an application of threshold voltagedistributions of memory cells programmed according to a program methodin FIG. 13. As compared with threshold voltage distributions in FIG. 14,a state read operation may be performed with respect to memory cellshaving an erase state E, and lower tail memory cells, normal memorycells, and upper tail memory cells in the erase state E may bedetermined.

Lower tail memory cells having an erase state E may be programmed to afirst upper program state P1_U during programming of a second bit 2SB.Normal memory cells having the erase state E may be programmed to afirst normal program state P1_N, and upper tail memory cells having theerase state E may be programmed to a first lower program state P1_L. Thefirst lower program state P1_L, the first normal program state P1_N, andthe first upper program state P1_U may form a first program state P1.

A state read operation may be additionally performed with respect to anerase state E, and a program operation may be carried out consideringcharge rearrangement determined from the state read operation. Uponfuture charge rearrangement, threshold voltage distributions of thefirst to third program states P1 to P3 may be narrowed.

FIG. 19 is a diagram illustrating another application of thresholdvoltage distributions of memory cells programmed according to a programmethod in FIGS. 10 and 13. A state read operation may be performed withrespect to memory cells having an erase state E prior to performing LSBprogramming, and lower tail memory cells, normal memory cells, and uppertail memory cells may be determined.

Memory cells having an erase state E may maintain the erase state or beprogrammed to an LSB program state LP by programming a least significantbit. For those memory cells to be programmed to the LSB program stateLP, lower tail memory cells having the erase state E may be programmedto a first upper program state LP1_U; normal memory cells having theerase state E may be programmed to a first normal program state LP1_N;and tail memory cells having the erase state E may be programmed to afirst lower program state LP1_L. The first lower program state LP1_L,the first normal program state LP1_N, and the first upper program stateLP1_U may form an LSB program state LP. Different verification voltagesmay be used to confirm programming to the different LSB programsub-states (the first lower program state LP1_L, the first normalprogram state LP1_N, and the first upper program state LP1_U).

A state read operation may be additionally performed with respect to anerase state E prior to LSB programming is performed, and a programoperation may be carried out considering rearrangement.

A state read operation and a program operation taking chargerearrangement into consideration for programming a second bit 2SB inmemory cells has been described with reference to FIGS. 14 to 19.However, the inventive concept is not limited thereto. For example, astate read operation and a program operation considering rearrangementcan be performed again for programming a third bit, a fourth bit, etc.(which may be a most significant bit). This may be in addition to takinginto consideration charge rearrangement when programming the second bit2SB or the second bit 2SB (or other bits) may be programmed withouttaking into consideration charge rearrangement.

FIG. 20 is a block diagram schematically illustrating a nonvolatilememory device according to still another embodiment. Referring to FIG.20, a nonvolatile memory device 200 may include a memory cell array 210,an address decoding unit 220, a page buffer unit 230, a datainput/output unit 240, a voltage generating unit 250, and a control unit260. As with all embodiments, the memory device 200 may be asemiconductor chip, or a group of chips (such as a stack of chips)within a semiconductor chip.

The memory cell array 210 may include a user data area 211 and a bufferarea 213. The nonvolatile memory device 200 may be substantiallyidentical to that in FIG. 1 except that 3-step programming is performedusing the buffer area 213. Buffer area 213 may be integrally formed withthe memory cell array. For example, if the memory device 200 is asemiconductor memory chip, buffer area 213 may be formed as part of thesemiconductor chip and may be formed from the same memory cell types asthe memory cells of the user data area 211. Buffer area 213 may beformed from a predetermined physical location of the memory cell array210 or may be determined by a block management system (which may allowmodification of the blocks of memory that constitute the buffer area 213and the user data area 211).

FIG. 21 is a flowchart illustrating a program method according toanother embodiment. Referring to FIGS. 20 and 21, in operation S210, anerase state and at least one program state of memory cells of a userdata area 311 may be determined by reading memory cells of a buffer area213. The buffer area 213 may store the currently stored data (e.g., LSBand 2SB data) of the memory cells (e.g., word line) that are to beprogrammed with an additional bit of data (e.g., MSB data). Data (e.g.,LSB and 2SB data) may be previously stored in the buffer area 213 byeither reading the memory cells (e.g., word line) prior to beingprogrammed with a subsequent bit (e.g., prior to coarse programmingadding an MSB data bit). Alternatively, data (e.g., LSB and 2SB data)may be previously stored in the buffer area 213 during the programmingof the word line with that data (e.g., the LSB and 2SB data) prior toprogramming the subsequent bit (e.g., MSB data). Alternatively, thebuffer area 213 may store all data to be programmed to the memory cells(e.g., LSB, 2SB and MSB data).

In operation S220, whether a fine program operation is to be performedmay be judged. If not, the method proceeds to operation S230, in which1-step programming or coarse programming is made. 1-step and coarseprogramming may include programming at higher program voltage VPGM orfor longer pulse durations of the program voltage VPGM as compared tofine programming. The course program states (e.g., CP1 to CP7 of FIG.22A) may have a Vth distribution range larger than the program statesresulting from fine programming. The 1-step programming may include onlya single programming cycle or include multiple programming cycles.

In case that the fine program operation is to be performed, the methodproceeds to operation S240, in which a state read operation on at leastone program state is performed (e.g., one or more of the course programstates CP1 to CP7 of FIG. 22A) using a plurality of state read voltageswhich may be in a manner as described elsewhere in this disclosure.Afterwards, in operation S240, a fine program operation may be executedusing a plurality of verification voltages having different levels,according to the state read result. U.S. Patent Publication No.2011/0222342 is incorporated by reference for its teachings of 1 stepprogramming, coarse programming and fine programming, as well as the useof a buffer area in connection with memory cell programming.

FIG. 22A is a diagram illustrating threshold voltage distributions ofmemory cells according to a program method in FIG. 21. Referring toFIGS. 20 to 22A, 1-step programming may be made with respect to memorycells. The 1-step programming may be executed without a state readoperation and a program operation using a state read result. 1-bit or2-bit data may be programmed in a memory cell of a user data area 211 bythe 1-step programming. Upon execution of the 1-step programming,program data may be further programmed in a buffer area 213. Forexample, the program data may be programmed in Single Level Cells (SLC)of the buffer area 213.

If the 1-step programming is performed, memory cells having an erasestate E of the user data area 211 may maintain an erase state E or maybe programmed to one of first to third program states OP1 to OP3. Whenthe 1-step programming results in four states (e.g., the erase state Eand first to third program states OP1 to OP3), the 1-step programmingmay program the memory cells (and thus select each memory cell for oneof these four states) based on 2-bit data (or two data pages for aphysical page of the memory) such as an LSB and a 2SB bit.

Charge rearrangement may occur after the 1-step programming is executed.If charge rearrangement occurs, threshold voltage distributions of thefirst to third program states OP1 to OP3 may widen.

Coarse programming may be performed after the 1-step programming on1-step programmed memory cells. Coarse programming may add an additionalbit of information (e.g., an MSB bit) to each memory cell. Coarseprogramming may include reading the state of the memory cells in theuser data area 211 to determined the existing data (e.g., two-bit data)to which the additional bit of information is to be added or the two-bitdata may be determined by reading memory cells of the buffer area 213(which may continue to store the two-bit data until programming iscomplete). Alternatively, the previously stored data (e.g., two-bitdata) may be obtained from a different source than the buffer area 213,such as a buffer memory in a memory controller controlling operations ofthe memory device 300. The coarse programming may be performed accordingto the determination of the two-bit data previously stored and programdata (e.g., the additional bit of data for each cell) to be programmed.If the coarse programming is performed, memory cells may maintain anerase state E or may be programmed to first to seventh coarse programstates CP1 to CP7. When the coarse programming is performed, the programdata may be further programmed in memory cells of the buffer area 213.For example, the program data may be programmed in Single Level Cells(SLC) of the buffer area 213.

After the coarse programming is performed, charge rearrangement mayoccur. This may make threshold voltage distributions of the first toseventh coarse program states CP1 to CP7 widen. In some examples,threshold voltage distributions of the first to seventh coarse programstates CP1 to CP7 may partially overlap with each other.

Fine programming may be executed with respect to coarse programmedmemory cells. As illustrated in FIG. 21, the fine programming mayaccompany a state read operation and a program operation using a stateread result.

An erase state and at least one program state of memory cells of theuser data area 211 may be determined by reading memory cells of thebuffer area 213. The buffer area 213 may store all data (e.g., threedata pages) of the memory cells being programmed, and this data can beused to determine the erase or program state of each of the memory cellsbeing programmed. A state read operation may be performed with respectto the at least one program state (or, an erase state). If the stateread operation is performed, lower tail memory cells, normal memorycells, and upper tail memory cells of each program state (or, an erasestate) may be determined. For example, memory cells may be determined tohave been programmed to coarse programming state CP1 by referencinginformation in the buffer are 213. When one or more neighboring coarseprogram states CP1 to CP7 overlap, it may be impracticable to determinethe coarse programming state to which a memory cell has been previouslyprogrammed by reading the memory cell. For example, when a memory cellhas a Vth value in a Vth distribution region shared by coarse programstates CP1 and CP2 (after charge rearrangement), it may be impracticableto determine whether this memory cell has been previously programmed tothe coarse program state CP1 or coarse program state CP2. Reference toinformation (e.g., the original three bit data of the memory cell) maybe referenced to determine the coarse program state to which the memorycell was previously programmed.

Memory cells may be programmed using a plurality of verificationvoltages according to a state read result. The lower tail memory cellsmay be programmed using an upper verification voltage, the normal memorycells may be programmed using a normal verification voltage, and theupper tail memory cells may be programmed using a lower verificationvoltage. Memory cells may be programmed to first to seventh programstates P1 to P7. In an alternative embodiment, upper tail memory cellsmay not be programmed in the fine program operation. The fine programoperation may be performed on lower tail memory cells and normal memorycells and the Vth levels of the upper tail memory cells may remain atthe levels resulting from the coarse programming operation (althoughadditional charge rearrangement, coupling with other memory cells, etc.may alter their Vth levels). FIG. 22B illustrates an example of thisalternative with respect to the fine programming of coarse programmingstate CP1, illustrating upper tail memory cells UT of coarse programstate CP1 remaining at their coarse program state, and normal memorycells N being verified in the fine program operation with a lowerverification voltage of VFYN and lower tail memory cells LT beingverified in the fine program operation with an upper verificationvoltage of VFYU. In this example, the threshold distribution rangesafter fine programming the lower tail, normal and upper tail memorycells from coarse program state are shown to be separate, but they mayoverlap as shown in FIG. 22A. In addition, while the alternative of FIG.22B eliminates the use of a verify voltage for upper tail memory cellsin connection with a modification of the embodiment of FIG. 22A, it iscontemplated this alternative is equally applicable to other embodimentsdescribed herein.

After the fine programming is performed, charge rearrangement may begenerated. In this case, threshold voltage distributions of the first toseventh program states P1 to P7 may become narrower. That is, the datareliability of the nonvolatile memory device 200 may be improved. Readvoltages of Vrd1, Vrd2, . . . Vrd7 may be applied to a selected wordline in a read operation to determine the program state (E, P1, P2 . . .P7) of memory cells connected to the selected word line and thus readthe data of the memory cells. Depending on the data to be read (e.g.,LSB or MSB) one or more reads with one or more of the read voltagesVrd1, Vrd2, . . . Vrd7 may be necessary. Read voltages Vrd1, Vrd2, . . .Vrd7 may be designed to be centered between neighboring threshold rangesrepresenting the program states (E, P1, P2 . . . P7). The read voltagesof this and other embodiments are shown to be outside the range of theplural verify voltages associated with a single program state (e.g., notinterposed within the verify voltages associated with a single programstate, such as one of E, P1, P2 . . . P7). However, it may beappropriate to allow the read voltages to have values within the rangeof verify voltages associated with a single program state.

FIG. 23 is a block diagram schematically illustrating a nonvolatilememory device according to still another embodiment. Referring to FIG.23, a nonvolatile memory device 300 may include a memory cell array 310,an address decoding unit 320, a page buffer unit 330, a datainput/output unit 340, a voltage generating unit 350, and a control unit360.

The memory cell array 310 may include a user data area 311 and asupplemental area 313. The nonvolatile memory device 300 may besubstantially identical to that in FIG. 1 except that a state readresult is programmed in the supplemental area 313. Supplemental area 313may be integrally formed with the memory cell array. For example, if thememory device 300 is a semiconductor memory chip, supplemental area 313may be formed as part of the semiconductor chip and may be formed fromthe same memory cell types as the memory cells of the user data area311. Supplemental area 313 may be formed from a predetermined physicallocation of the memory cell array 310 or may be determined by a blockmanagement system.

FIG. 24 is a flowchart illustrating a program method according to stillanother embodiment. Referring to FIG. 24, in operation S310, firstprogram data may be programmed in memory cells. For example, the firstprogram data may be received, data previously programmed in memory cellsmay be read, a state read operation may be performed, and the firstprogram data may be programmed according to the first program data, theread result, and the state read result.

In operation S320, the state read result may be programmed in asupplemental area 313.

In operation S330, second program data to be programmed in memory cellsmay be received. For example, the second program data may be upper bitdata to be programmed following the first program data. Alternatively,second program data may be lower bit data to be programmed after memorycells are erased.

In operation S340, an erase state and at least one program state may bejudged by reading memory cells. The operation S340 may correspond tooperation S120 in FIG. 9.

In operation S350, a state read result may be read out from thesupplemental area 313. A state read result programmed in thesupplemental area 313 in operation S320 may be read out in operationS350. The state read result thus read may be stored in rearrangementlatches RL.

In operation S360, the second program data may be programmed in memorycells using a plurality of verification voltages having differentlevels, according to the state read result. The operation S360 maycorrespond to operation S150 in FIG. 9.

As described above, a rearrangement characteristic of memory cells maybe judged via a state read operation, and a state read result may beprogrammed in the supplemental area 313 of a memory cell array 310.Afterwards, when data is programmed in corresponding memory cells, arearrangement characteristic may be determined according to a state readresult programmed in the supplemental area 313, and a program operationmay be performed. Use of state read results stored in supplemental area313 may allow use of state read results in plural programming operationswithout the need to perform plural state read operations (e.g., for eachmemory cells of a physical page of memory cells, plural programmingoperations to the memory cell may use a state read results stored in thesupplemental area 313 obtained from a single state read operation ofthat memory cell). It may also be possible to modify the state readresults programmed in the supplemental area with future state readresults. Thus, it is possible to provide a nonvolatile memory device 300with the improved data reliability and a program method thereof

FIG. 25 is a block diagram schematically illustrating a nonvolatilememory device according to still another embodiment. Referring to FIG.25, a nonvolatile memory device 400 may include a memory cell array 410,an address decoding unit 420, a page buffer unit 430, a datainput/output unit 440, a voltage generating unit 450, and a control unit460.

The memory cell array 410 may include a user data area 411 and a testdata area 413. The nonvolatile memory device 400 may be substantiallyidentical to that in FIG. 1 except that reading is made with respect tothe test data area 413 without execution of a state read operation.

The test data area 413 may store information associated with arearrangement characteristic of memory cells in the user data area 411.In an embodiment, memory cells of the user data area 411 in thenonvolatile memory device 400 may be tested, and a test result may beprogrammed in the test data area 413.

FIG. 26 is a flowchart illustrating a program method according to stillanother embodiment. Referring to FIGS. 25 and 26, in operation S410,data to be programmed in memory cells of a user data area 411 may bereceived. The operation S410 may correspond to operation S110 in FIG. 9.

In operation S420, memory cells in the user data area may be read suchthat an erase state and at least one program state are judged. Theoperation S420 may correspond to operation S120 in FIG. 9.

In operation S430, a read operation may be carried out with respect tomemory cells of a test data area 413 corresponding to memory cells ofthe user data area 411. For example, a read operation may be performedwith respect to memory cells that store information associated with arearrangement characteristic of memory cells of the user data area 411.

In operation S440, program data may be stored in memory cells of theuser data area 411 using a plurality of verification voltages havingdifferent levels, based on a read result on memory cells of the testdata area 413.

As described in relation to FIGS. 25 and 26, a rearrangementcharacteristic of memory cells may be detected via testing, andinformation indicating the rearrangement characteristic may beprogrammed in the test data area 413. Testing may occur as part of amanufacturing process (e.g., prior to packaging the memory device orafter packaging memory device, but prior to determining a packagingdefect, or prior to shipping to a third party after packaging).Alternatively or in addition, testing may be performed as a backgroundoperation, such as when the memory device is not being accessed. Forexample, blocks in a NAND flash memory device (such as free blocks) mayhave test data written to physical pages of the blocks, which are thensubsequently read with state read operations to determine rearrangementcharacteristics of the memory cells of the physical pages. Test data maybe stored for each memory cell or may be stored for a group of memorycells (e.g., such as for all memory cells within a certain physicalarea). A program operation on the user data area 411 may be performed inview of rearrangement, based on information associated with therearrangement characteristic programmed in the test data area 413.

FIG. 27 is a flowchart illustrating a program method according to stillanother embodiment. Referring to FIGS. 25 and 27, in operation S510,first data may be received and programmed in first memory cellsconnected to a first word line.

In operation S520, second data may be received and programmed in secondmemory cells that are connected to a second word line adjacent to thefirst word line connected to the first memory cells.

In operation S530, a state read may be performed on the program statesof the first data programmed in the first memory cells using a pluralityof state-read voltages. The state read may be performed in a mannersimilar to that described with respect to FIG. 12, FIG. 22A or withrespect to other description provided herein.

In operation S540, third data may be received and programmed in thefirst memory cells connected to the first word line using a plurality ofverify voltages for each program state (or for one or less than allprogram states). The resulting program states may represent thecombination of first data and third data. For example, the first datamay be LSB data and 2SB data and may result in program states E, OP1,OP2 and OP3 as shown in FIG. 22A after the programming in operationS510. The third data may be MSB data and the programming in operationS540 may result in program states E and P1-P7 as shown in FIG. 22A(coarse programming described with respect to FIG. 22A may also beperformed or may not be performed). In operation S540, the selection ofthe verify voltage for each memory cell may take into consideration boththe results of the state-read operation in operation S530 as well as thesecond data programmed into the second memory cells. The second data mayeither be read from the second word line prior to step S540, or mayremain in page buffer latches, such as rearrangement latches RL afterthe programming of the second data in the second memory cells inoperation S520. Second data of the second word line may be used whendetermining a verify voltage used to program the third data in thememory cells of the first word line. For example, a verify voltage toprogram a specific memory cell of the first memory cells with third datain step S540 may be decided according to a difference between thethreshold voltage of the specific memory cell after programming firstdata into the specific memory cell and threshold voltages of one or moresecond memory cells that are adjacent to the specific memory cell.Alternatively, or in addition, a verify voltage to program a specificmemory cell of the first memory cells with third data in step S540 maybe decided according to an increase of the threshold voltage to aneighboring second memory cell (or increases of threshold voltages ofmultiple neighboring second memory cells) due to programming of thesecond data into the second memory cells in operation S520 afterprogramming the first data into the first memory cells in operationS510.

Charges may be trapped at an information storage film of the specificmemory cell when the first program data is programmed. Charges trappedat the specific memory cell may be affected by an electric field fromcharges trapped at adjacent memory cells. Rearrangement of chargestrapped at the specific memory cell may be affected by the electricfield. As a difference between a threshold voltage of the specificmemory cell and threshold voltages of adjacent memory cells becomeslarge, the strength of the electric field may become strong. That is,influence of the neighboring second memory cell on the rearrangement maybe increased. In addition, the neighboring second memory cell may affecta Vth level of the specific memory cell through other mechanisms, suchas parasitic coupling due to an increase of the Vth of the second memorycell from the programming of the second memory cell in step S520. Thus,Vth shift of the specific memory cell (e.g., a first memory cell of thefirst word line) may be assessed as a Vth shift due to rearrangementcharacteristics of the specific memory cell and Vth shift due to variousinfluences of neighboring second memory cell(s) (such as a Vthdifference with the specific cell and/or a Vth change of the secondmemory cell due to subsequent programming after programming the firstdata in operation 510). By analyzing a neighboring second memory cell's(or multiple neighboring second memory cells') Vth change and/or Vthdifference with the specific memory cell, an estimate can be made as tosecond memory cell's/cells' influence on the Vth shift of the specificmemory cell after programming the first data and removed as a factorfrom results of the state read in operation S530 to determinerearrangement characteristics of the specific memory cell. If thisestimated shift from the influence of neighboring memory cells isconsistent with a Vth shift determined from the state read in operationS530, the specific memory cell may be determined as a normal memory celland a normal verify voltage may be used in the subsequent programoperation S540 (in the verify sub-step of one or more program loops). Ifthe estimated shift from the influence of neighboring memory cells doesnot account for a Vth shift determined from the state read in operationS530 (e.g., a Vth to an upper tail region or lower tail region of aprogram state), a verify voltage other than the normal verify voltagemay be used in the subsequent program operation S540 (e.g., an upperverification voltage for lower tail memory cells and a lowerverification voltage for upper tail memory cells in the verify sub-stepof one or more program loops). In addition, an estimated shift from theinfluence of neighboring memory cells may be determined to counteract aVth shift from rearrangement. In this case, the determined Vth shiftfrom rearrangement may be used to select a verify voltage for use infuture programming, even if no or no significant Vth shift is apparentfrom execution of the state read in step S530. Programming the thirddata in operation S540 may be made considering rearrangement accordingto the determined (or, predicted) rearrangement characteristics asdescribed in relation to FIGS. 13 and 14.

In an embodiment, when a program method of FIG. 27 is executed, a lowerstate read voltage VSRL, a normal state read voltage VSRN and an upperstate read voltage VSRU may be generated and used by a nonvolatilememory device 400 in FIG. 25.

FIG. 28 is a flowchart illustrating a program method according to stillanother embodiment. Referring to FIGS. 25 and 28, in operation S610,first program data to be programmed in first memory cells of a firstword line may be received. The first program data may be stored in datalatches DL.

In operation S620, there may be received second program data to beprogrammed in second memory cells which are connected to a second wordline adjacent to a word line connected to the first memory cells. Thesecond program data may also include data in one or more other wordlines adjacent the first word line in addition to the second word line.The second program data may be data to be programmed after the firstprogram data is programmed in the first word line. The second data maybe stored in data latches DL or rearrangement latches RL.

In operation S630, the first program data may be programmed in the firstmemory cells using a plurality of verification voltages having differentlevels, based on the second program data. Memory cells programmed withthe first program data may experience a threshold voltage shift, whichmay be due to charge rearrangement or may be due to other parasiticinfluences, due to influence of an electric field and/or other factorswhen the second program data is programmed. Thus, it is possible toimprove the data reliability of the nonvolatile memory device 400 byconsidering an effect on Vth due to data to be subsequently programmedin adjacent memory cells. As will be apparent, predicting the effect ofsubsequently programmed adjacent memory cells on Vth shift of the firstmemory cells may be the only factor in selecting one of multiple verifyvoltages for each program state, or may be one of multiple factors. Forexample, other factors may also be used to select one of multiple verifyvoltages, such as performing a state read of previous program and/orerase states (e.g., as described with respect to FIGS. 12 and 22A),and/or prior programming of neighboring memory cells (e.g., as describedwith respect to FIG. 27).

In an embodiment, when a program method of FIG. 28 is executed, a lowerstate read voltage VSRL, a normal state read voltage VSRN and an upperstate read voltage VSRU may be generated and used by a nonvolatilememory device 400 in FIG. 25.

FIG. 29 is a flowchart illustrating a program method according to stillanother embodiment. Referring to FIG. 29, in operation S810, programdata to be programmed in memory cells may be received. For example, LSBdata may be received as program data, 2SB data may be received asprogram data, MSB data may be received as program data, etc.

In operation S820, the program data may be loaded onto data latches DL(refer to FIG. 1). Bit lines BL may be biased according to the programdata in the data latches DL.

In operation S830, there may be executed a program loop in which aprogram voltage and a verification voltage are applied. For example, inoperation S830, a program voltage may be applied once to a selected wordline, and then a verification voltage may be applied once to theselected word line. Only one verification operation (with oneverification voltage) may be performed each time operation S830 isperformed.

In operation S840, whether a threshold condition is satisfied may bejudged. For example, the threshold condition may be a number of programloops of operation S830 performed. When a program loop number is over aspecific value, the threshold condition may be satisfied. In addition oralternatively, threshold condition may include a first program pass.When any of the memory cells are first detected to pass programming (asdetermined by the verification operation of operation S830, thethreshold condition may be satisfied. The threshold condition may besatisfied by a certain number of program passed memory cells. When thenumber of memory cells detected to pass programming (as determined bythe verification operation of S830) is over a specific value, thethreshold condition may be satisfied. Other various conditions may beused as the threshold condition. If the threshold condition issatisfied, the method proceeds to operation S850. If the thresholdcondition is not satisfied, the method returns to and repeats operationS830. In this case, a program voltage may be increased.

When the threshold condition is met, the method proceeds to operationS850. In operation S850, a state read operation on memory cells beingprogrammed (memory cells whose threshold voltages are adjusted) may beperformed using a plurality of state read voltages. A delay time may beprovided between steps S830 and S850 to provide sufficient time forcharge rearrangement. See, for example, U.S. Pat. No. 7,813,183regarding providing a exemplary delay time between application of aprogramming pulse (or erase voltage) and a subsequent read or verifyoperation, the contents of which are hereby incorporated by reference.In operation S860, as a program loop is executed, a program voltage maybe applied once, while a plurality of verification voltages havingdifferent levels may be applied, respectively, to verify programmingvarious memory cells with different verification levels (e.g., as donewith respect to other embodiments described herein). Which memory cellsare verified by which of the plurality of verification voltages may bedetermined according to a state read result, as discussed elsewhereherein. Alternatively, other factors described herein, such asneighboring memory cells as described with respect to FIGS. 27 and 28may be used in addition or in place of the state read operation of S850to determine which of the plurality of verification voltages should beused for a particular memory cell of the memory cells to be programmed.The program voltage applied across the memory cells to be programmed inoperation S860 may be consistent with the program voltages appliedacross memory cells to be programmed in operation S830 (e.g., sameprogram voltage, or a new program voltage incremented in the same manneras between subsequent program voltages of operation S830).Alternatively, the program voltage applied across the memory cells to beprogrammed in operation S860 may be a soft program voltage, less thanotherwise may have been applied in a subsequent operation S830. See, forexample, U.S. Patent Publication 2012/010374, herein incorporated byreference in its entirety, regarding exemplary soft programming ofmemory cells, as well as other exemplary programming features. Forexample, U.S. Patent Publication 2012/010374 also discusses re-verifyinga cell that is already determined to be programmed, and if suchverification fails, applying programming voltage(s) to that cell, whichmay also be utilized by the methods and devices described herein.

In operation S870, program pass may be judged. The method may be endedupon program pass. Upon program fail, the method returns to and repeatsoperation S860. At this time, a program voltage may be increased. Whilenot shown in FIG. 29, after a certain number of program fails, themethod may end and it may be determined that there is an error, such asa defective memory. The method of FIG. 29 may be performed withoutinterruption of other programming besides those memory cells receivingprogramming data in operation S810. If the method of FIG. 29 is appliedto a word line (i.e., the program data received in operation S810 is fora selected word line), the method of FIG. 29 may be performed withoutinterruption of programming of neighboring word lines.

FIG. 30A is a timing diagram illustrating voltages applied to a selectedword line according to a program method in FIG. 29. FIG. 30B is a graphillustrating a variation in a threshold voltage distribution of memorycells according to a program method in FIG. 29 and a voltage applyingmanner in FIG. 30A.

Referring to FIGS. 30A and 30B, during execution of each of firstseveral program loops, a program voltage VPGM may be applied once to theword line to which the memory cells are connected, and a verificationvoltage VFY1 may be applied once to verify the programming of the memorycells. The program voltage VPGM may be increased at each iteration ofthese program loops. As the program loop is iterated, threshold voltagesof programmed memory cells may be increased from an erase state E, orfrom a program state resulting from a previous program operation (notshown in FIGS. 29 and 30A). Memory cells with increased thresholdvoltages (or, memory cells being programmed) may have an intermediatestate IS.

If a threshold condition is satisfied, a state read operation may becarried out. A state read operation may be performed with respect tomemory cells having the intermediate state IS. The state read operationmay be performed by applying a normal state read voltage VSRN and anupper state read voltage VSRU to the memory cells having theintermediate state. The normal state read voltage VSRN may be higher inlevel than the upper state read voltage VSRU. The upper state readvoltage VSRU may be equal in level to the verification voltage VFY1. Thestate read operation may be performed as noted with respect to otherembodiments described herein.

If the state read operation is performed, upper tail memory cells LP_U,normal memory cells LP_N, and lower tail memory cells LP_L may bediscriminated. For certain memory devices (such as those with very smallmemory cells), charge rearrangement or other factors causing a thresholdshift may occur in a short period of time. Thus, rearrangement may occurand/or substantially reflect rearrangement characteristics of the memorycell between programming loops during programming. If a state readoperation is carried out when a threshold condition is satisfied, uppertail memory cells LP_U, normal memory cells LP_N, and lower tail memorycells LP_L may be discriminated. Herein, threshold voltages of the uppertail memory cells LP_U may be increased due to the rearrangement,threshold voltages of the normal memory cells LPN may not significantlyvary although the rearrangement is generated, and threshold voltages ofthe lower tail memory cells LP_L may be decreased due to therearrangement.

Afterwards, a program loop considering determined rearrangementcharacteristics of the memory cells may be performed. The upper tailmemory cells LP_U may be programmed using a lower verification voltageVFYL, the normal memory cells LP_N may be programmed using a normalverification voltage VFYN, and the lower tail memory cells LP_L may beprogrammed using an upper verification voltage VFYU. Memory cells havingthe intermediate state IS may be programmed to a program state LP byprogramming. If a program operation is performed in view of therearrangement, a threshold voltage distribution of memory cells maybecome narrow when the rearrangement is generated.

In an alternative embodiment, a state read result may be stored in asupplemental area of a memory cell array so as to be read if necessary.A state read result can be output to an external device. In case that arearrangement characteristic of memory cells is previously stored in atest area or supplemental area of a memory cell array, a programoperation may be performed based on the rearrangement characteristicread from the test area without the state read operation of operationS850.

FIG. 31 is a circuit diagram illustrating an equivalent circuit of apart EC of a top view in FIG. 3 according to another embodiment. Anequivalent circuit BLKa2 in FIG. 31 may be different from that in FIG. 7in that lateral transistors LTR are added in each cell string.

Referring to FIGS. 3 to 6 and 31, lateral transistors LTR in each cellstring may be connected between a ground selection transistor GST and acommon source line CSL. Gates of the lateral transistors LTR in eachcell string may be connected to a ground selection line GSL togetherwith a gate (or, a control gate) of a ground selection transistor GSTtherein.

Channel films 114 may operate as vertical bodies of first conductivematerials CM1. That is, the first conductive materials CM1 mayconstitute vertical transistors together with the channel films 114. Thefirst conductive materials CM1 may constitute ground selectiontransistors GST vertical to a substrate 111 together with the channelfilms 114.

Information storage films 116 may be provided between the substrate 111and the first conductive materials CM1. The substrate 111 may act as ahorizontal body of the first conductive materials CM1. That is, thefirst conductive materials CM1 may form the lateral transistors LTRtogether with the substrate 111.

When a voltage is applied to the first conductive materials CM1, anelectric field may be formed between the first conductive materials CM1and the channel films 114. The electric field may enable channels to beformed at the channel films 114. When a voltage is applied to the firstconductive materials CM1, an electric field may be formed between thefirst conductive materials CM1 and the substrate 111. The electric fieldmay enable channels to be formed at the substrate 111. Channels formedat the substrate 111 may be coupled with common source regions CSR andthe channel films 114. When a voltage is applied to the ground selectionline GSL, the ground selection transistors GST and the lateraltransistors LTR may be turned on. This may enable cell strings CS11,CS12, CS21, and CS22 to be connected with a common source line CSL.

FIG. 32 is a circuit diagram illustrating an equivalent circuit of apart EC of a top view in FIG. 3 according to still another embodiment.An equivalent circuit BLKa3 in FIG. 32 may be different from that inFIG. 7 in that ground selection transistors GST are connected with firstand second ground selection lines GSL1 and GSL2. Referring to FIGS. 3 to6, and 32, first conductive materials CM1 may constitute first andsecond ground selection lines GSL1 and GSL2.

As described in relation to FIGS. 1 to 28, rearrangement characteristicsof memory cells MC1 to MC6 may be detected (or, predicted) via reading.As described in relation to FIGS. 1 to 28, the memory cells MC1 to MC8may be programmed in view of the detected (or, predicted) rearrangementcharacteristics.

As described with reference to FIG. 31, lateral transistors LTR can beprovided to the equivalent circuit BLKa3.

FIG. 33 is a circuit diagram illustrating an equivalent circuit of apart EC of a top view in FIG. 3 according to still another embodiment.Referring to FIGS. 3 to 6 and 33, a plurality of sub blocks may beprovided. In this embodiment, second and third conductive materials CM2and CM3 may constitute first and second memory cells MC1 and MC2, whichare used as a first sub block. Sixth and seventh conductive materialsCM6 and CM7 may constitute third and fourth memory cells MC3 and MC4,which are used as a second sub block. Fourth and fifth conductivematerials CM4 and CM5 may constitute first and second dummy memory cellsDMC1 and DMC2 provided between the first and second sub blocks. Thefirst and second sub blocks may be programmed, read, and erasedindependently from each other.

As described in relation to FIGS. 1 to 28, rearrangement characteristicsof memory cells MC1 to MC4 may be detected (or, predicted) via reading.As described in relation to FIGS. 1 to 28, the memory cells MC1 to MC4may be programmed in view of the detected (or, predicted) rearrangementcharacteristics.

As described with reference to FIG. 31, lateral transistors LTR can beprovided to the equivalent circuit BLKa3.

FIG. 34 is a circuit diagram illustrating an equivalent circuit of apart EC of a top view in FIG. 3 according to still another embodiment.Referring to FIGS. 3 to 6, and 34, first and second conductive materialsCM1 and CM2 may constitute ground selection transistors GSTa and GSTbrespectively having first and second heights. Seventh and eighthconductive materials CM7 and CM8 may constitute string selectiontransistors SSTa and SSTb respectively having seventh and eighthheights. Third to sixth conductive materials CM3 to CM6 may constitutefirst to fourth memory cells MC1 to MC4.

The first and second conductive materials CM1 and CM2 may be connectedin common to form a ground selection line GSL. Cell strings CS11, CS12,CS21, and CS22 may be connected in common with a string selection lineGSL.

The cell strings CS11 and CS12 may be connected with two stringselection lines SSL 1 a and SSL1 b respectively having seventh andeighth heights and formed by seventh and eighth conductive materials CM7and CM8. The cell strings CS21 and CS22 may be connected with two stringselection lines SSL2 a and SSL2 b respectively having the seventh andeighth heights and formed by the seventh and eighth conductive materialsCM7 and CM8.

Conductive materials respectively corresponding to at least threeheights can form string selection transistors. Conductive materialsrespectively corresponding to at least three heights may form stringselection transistors.

As described in relation to FIGS. 1 to 28, rearrangement characteristicsof memory cells MC1 to MC4 may be detected (or, predicted) via reading.As described in relation to FIGS. 1 to 28, the memory cells MC1 to MC4may be programmed in view of the detected (or, predicted) rearrangementcharacteristics.

Like an equivalent circuit BLKa2 described with reference to FIG. 31,lateral transistors LTR may be provided to the equivalent circuit BLKa5.Like an equivalent circuit BLKa3 described with reference to FIG. 32,cell strings CS11 and CS12 may be connected with one ground selectionline (not shown), and cell strings CS21 and CS22 may be connected withanother ground selection line (not shown). Like an equivalent circuitBLKa4 described with reference to FIG. 33, memory cells MC1 to MC4 mayconstitute a plurality of sub blocks.

FIG. 35 is a circuit diagram illustrating an equivalent circuit of apart EC of a top view in FIG. 3 according to still another embodiment.An equivalent circuit BLKa6 in FIG. 35 may be different from that inFIG. 34 in that string selection transistors SSTa and SSTb in cellstrings of the same row share a string selection line. String selectiontransistors SSTa and SSTb in cell strings CS11 and CS12 may be connectedin common to a first string selection line SSL1, and string selectiontransistors SSTa and SSTb in cell strings CS21 and CS22 may be connectedin common to a second string selection line SSL2.

As described in relation to FIGS. 1 to 28, rearrangement characteristicsof memory cells MC1 to MC4 may be detected (or, predicted) via reading.As described in relation to FIGS. 1 to 28, the memory cells MC1 to MC4may be programmed in view of the detected (or, predicted) rearrangementcharacteristics.

Like an equivalent circuit BLKa2 described with reference to FIG. 31,lateral transistors LTR may be provided to the equivalent circuit BLKa6.Like an equivalent circuit BLKa3 described with reference to FIG. 32,cell strings CS11 and CS12 may be connected with one ground selectionline (not shown), and cell strings CS21 and CS22 may be connected withanother ground selection line (not shown). Like an equivalent circuitBLKa4 described with reference to FIG. 33, memory cells MC1 to MC4 mayconstitute a plurality of sub blocks.

FIG. 36 is a circuit diagram illustrating an equivalent circuit of apart EC of a top view in FIG. 3 according to still another embodiment.Referring to FIGS. 3 to 6 and 36, second conductive materials CM2 mayconstitute first dummy memory cells DMC1, and seventh conductivematerials CM7 may constitute second dummy memory cells DMC2.

In an embodiment, conductive materials corresponding to two or moreheights may constitute dummy memory cells (not shown) disposed betweenmemory cells and a ground selection transistor GST. Conductive materialscorresponding to two or more heights may constitute dummy memory cells(not shown) disposed between memory cells and a string selectiontransistor SST. Dummy memory cells (not shown) can be disposed to beadjacent to any one of the ground and string selection transistors GSTand SST.

As described in relation to FIGS. 1 to 28, rearrangement characteristicsof memory cells MC1 to MC4 may be detected (or, predicted) via reading.As described in relation to FIGS. 1 to 28, the memory cells MC1 to MC4may be programmed in view of the detected (or, predicted) rearrangementcharacteristics.

Like an equivalent circuit BLKa2 described with reference to FIG. 31,lateral transistors LTR may be provided to the equivalent circuit BLKa7.Like an equivalent circuit BLKa3 described with reference to FIG. 32,cell strings CS11 and CS12 may be connected with one ground selectionline (not shown), and cell strings CS21 and CS22 may be connected withanother ground selection line (not shown). Like an equivalent circuitBLKa4 described with reference to FIG. 33, memory cells MC1 to MC4 mayconstitute a plurality of sub blocks.

As described with reference to FIG. 34, conductive materials of two ormore heights may constitute string selection transistors SSTa and SSTb.Conductive materials of two or more heights may constitute groundselection transistors GSTa and GSTb. As described with reference to FIG.35, string selection transistors SSTa and SSTb of the same row may beconnected with one string selection line SSL1 or SSL2.

FIG. 37 is a perspective view taken along a line IV-IV′ in FIG. 3according to another embodiment. FIG. 38 is a cross-sectional view takenalong a line IV-IV′ in FIG. 3 according to another embodiment. Referringto FIGS. 3, 37, and 38, first information storage films 116 a may beprovided among conductive materials CM1 to CM8, insulation materials 112and 112 a, and pillars PL, and second information storage films 116 bmay be provided on inner sides of the pillars PL.

The first information storage films 116 a may include blockinginsulation films such as third sub insulation films 119 (refer to FIGS.4 and 5). The first information storage films 116 a may be formed at thesame location as information storage films 116 illustrated in FIGS. 4and 5. The second information storage films 116 b may include chargetrap films and tunneling insulation films such as first and second subinsulation films 117 and 118.

An equivalent circuit of a memory block described with reference toFIGS. 3, 37, and 38 may be one of the above-described equivalentcircuits BLKa1 to BLKa7.

FIG. 39 is a perspective view taken along a line IV-IV′ in FIG. 3according to still another embodiment. FIG. 40 is a cross-sectional viewtaken along a line IV-IV′ in FIG. 3 according to still anotherembodiment. Referring to FIGS. 3, 39, and 40, lower pillars PLa andupper pillars PLb may be provided to be stacked in a directionperpendicular to a substrate 111.

The lower pillars PLa may penetrate insulation films 112 and 112 a alonga third direction to contact with the substrate 111. Each of the lowerpillars PLa may include a lower channel film 114 a and a lower innermaterial 115 a. The lower channel films 114 a may include asemiconductor material having the same conductivity type as thesubstrate 111 or an intrinsic semiconductor. The lower channel films 114a may act as vertical bodies of first to fourth conductive materials CM1and CM4, respectively. The lower inner materials 115 a may include aninsulation material.

The upper pillars PLb may be provided on the lower pillars PLa,respectively. The upper pillars PLb may penetrate the insulation films112 along a third direction to contact with upper surfaces of the lowerpillars PLa. Each of the upper pillars PLb may include an upper channelfilm 114 b and an upper inner material 115 b. The upper channel films114 b may include a semiconductor material having the same conductivitytype as the lower channel films 114 a or an intrinsic semiconductor. Theupper channel films 114 b may act as vertical bodies of fifth to eighthconductive materials CM5 and CM8, respectively. The upper innermaterials 115 b may include an insulation material.

The lower channel films 114 a and the upper channel films 114 b may beconnected to act as a vertical body. For example, semiconductor pads SPmay be provided on the lower pillars PLa, respectively. Thesemiconductor pads SP may include a semiconductor material having thesame conductivity type as the lower channel films 114 a or an intrinsicsemiconductor. The lower channel films 114 a and the upper channel films114 b may be interconnected via the semiconductor pads SP.

In this embodiment, among the first to eighth conductive materials CM1to CM8, conductive materials adjacent to the semiconductor pads SP mayconstitute dummy word lines and dummy memory cells. For example, thefourth conductive material CM4 adjacent to the semiconductor pads SP,the fifth conductive material CM5, or the fourth and fifth conductivematerials CM4 and CM5 may constitute dummy word lines and dummy memorycells.

An equivalent circuit of a memory block described with reference toFIGS. 3, 39, and 40 may be identical to one of the above-describedequivalent circuits BLKa1 to BLKa7.

FIG. 41 is a perspective view taken along a line IV-IV′ in FIG. 3according to still another embodiment. FIG. 42 is a cross-sectional viewtaken along a line IV-IV′ in FIG. 3 according to still anotherembodiment. Referring to FIGS. 3, 41, and 42, lower pillars PLa andupper pillars PLb may be provided (refer to FIGS. 39 and 40). Firstinformation storage films 116 a may be provided among conductivematerials CM1 to CM8, insulation materials 112 and 112 a, and pillarsPLa and PLb, and second information storage films 116 b may be providedon inner sides of the pillars PLa and PLb (refer to FIGS. 37 and 38).

An equivalent circuit of a memory block described with reference toFIGS. 3, 41, and 42 may be identical to one of the above-describedequivalent circuits BLKa1 to BLKa7.

FIG. 43 is a top view illustrating one memory block in FIG. 2 accordingto another exemplary embodiment. FIG. 44 is a perspective view takenalong a line X X X X IV-X X X X IV′ in FIG. 43. FIG. 45 is across-sectional view taken along a line X X X X IV-X X X X IV′ in FIG.43.

As compared with a memory block BLKa described with reference to FIGS. 3to 6, a string selection line cut SSL Cut and a word line cut WL Cutextending along a first direction may be provided in turn in a seconddirection. The word line cut WL Cut may penetrate conductive materialsCM1 to CM8 and insulation materials 112 and 112 a to expose portions ofcommon source regions CSR. The string selection line cut SSL Cut maypenetrate one or more conductive materials (e.g., CM8) and insulationmaterials 112 thereon. The string selection line cut SSL Cut mayseparate an eighth conductive lines CM8 constituting string selectiontransistors SST. When conductive lines of two or more heights constitutestring selection transistors SST, the string selection line cut SSL Cutmay separate conductive materials of two or more heights.

A part EC of a top view of FIG. 43 may be identical to one of theabove-described equivalent circuits BLKa1 to BLKa7.

In this embodiment, pillars PL can be formed of lower pillars and upperpillars as described in FIGS. 39 and 40.

In an embodiment, first information storage films 116 a and secondinformation storage films 116 b may be provided as described withreference to FIGS. 37 and 38.

FIG. 46 is a top view illustrating a part of one memory block in FIG. 2according to still another embodiment. FIG. 47 is a perspective viewtaken along a line X X X X VII-X X X X VII′ in FIG. 46. FIG. 48 is across-sectional view taken along a line X X X X VII-X X X X VII′ in FIG.46.

As compared with a memory block BLKa described in FIGS. 3 to 6, pillarsprovided between adjacent common source regions may be disposed in azigzag shape along a first direction.

As described in FIGS. 39 and 40, pillars PL may be formed of lowerpillars and upper pillars. As described in FIGS. 37 to 38, firstinformation storage films 116 a and second information storage films 116b may be provided. As described with reference to FIGS. 43 to 45, astring selection line cut SSL Cut can be provided. One line of pillarsdisposed in a zigzag shape along the first direction can be providedbetween word line and string selection line cuts WL Cut and SSL Cutwhich are adjacent to each other.

A part EC of a top view in FIG. 46 may correspond to one ofabove-described equivalent circuits BLKa1 to BLKa7.

FIG. 49 is a top view illustrating a part of one memory block in FIG. 2according to still another embodiment. FIG. 50 is a perspective viewtaken along a line X X X X X-X X X X X′ in FIG. 49. A cross-sectionalview taken along a line X X X X X-X X X X X′ in FIG. 49 may be identicalto that in FIG. 5, and description thereof is thus omitted.

As compared with a memory block BLKa described in FIGS. 3 to 6, a memoryblock BLKd may include square pillars PL. Insulation materials IM may beprovided between pillars PL. The pillars PL may be disposed in linealong a first direction between adjacent common source regions CSR. Theinsulation materials IM may extend along the third direction so as tocontact with a substrate 111.

Each of the pillars PL may include a channel film 114 and an innermaterial 115. Exemplarily, the channel film 114 may be provided on twosides, adjacent to conductive materials CM1 to CM8, from among foursides of a corresponding pillar, not surrounding the correspondingpillar.

A channel film on one side of each pillar may constitute a cell stringtogether with conductive materials CM1 to CM8 and information storagefilms 116. A channel film on the other side of each pillar mayconstitute another cell string together with conductive materials CM1 toCM8 and information storage films 116. That is, one pillar may be usedto form two cell strings.

In an embodiment, as described in FIGS. 39 and 40, pillars PL may beformed of lower pillars and upper pillars. As described in FIGS. 37 and38, first information storage films 116 a and second information storagefilms 116 b may be provided. As described with reference to FIGS. 43 to45, a string selection line cut SSL Cut can be provided. One line ofpillars PL disposed in a zigzag shape along a first direction can beprovided between a word line cut WL Cut and a string selection line cutSSL Cut that are disposed to be adjacent.

A part EC of a top view in FIG. 49 may correspond to one ofabove-described equivalent circuits BLKa1 to BLKa7.

FIG. 51 is a top view illustrating a part of one memory block in FIG. 2according to still another embodiment. FIG. 52 is a perspective viewtaken along a line X X X X Xi II-X X X X X II′ in FIG. 51. FIG. 53 is across-sectional view taken along a line X X X X X II-X X X X X II′ inFIG. 51.

Referring to FIGS. 51 to 53, first to eight upper conductive materialsCMU1 to CMU8 extending along a first direction may be provided on asubstrate 111. The first to fourth upper conductive materials CMU1 toCMU4 may be stacked in a direction perpendicular to the substrate 111and spaced apart from one another in a direction perpendicular to thesubstrate 111. The fifth to eighth upper conductive materials CMU5 toCMU8 may be stacked in a direction perpendicular to the substrate 111and spaced apart from one another in a direction perpendicular to thesubstrate 111. A group of the first to fourth upper conductive materialsCMU1 to CMU4 may be spaced apart from a group of the fifth to eighthupper conductive materials CMU5 to CMU8 along a second direction.

Lower conductive materials CMD1 a, CMD1 b, and CMD2 to CMD4 extendingalong the first direction may be provided between the first to fourthupper conductive materials CMU1 to CMU4 and the fifth to eighth upperconductive materials CMU5 to CMU8. The lower conductive materials CMD2to CMD4 may be stacked in a direction perpendicular to the substrate 111and spaced apart from one another in a direction perpendicular to thesubstrate 111. The lower conductive materials CMD 1 a and CMD 1 b may beprovided on the lower conductive material CMD2. The lower conductivematerials CMD1 a and CMD1 b may be spaced apart along the seconddirection.

A plurality of upper pillars PLU may be configured to penetrate thefirst to fourth upper conductive materials CMU1 to CMU4 or the fifth toeighth upper conductive materials CMU5 to CMU8 in a directionperpendicular to the substrate 111. The upper pillars PLU may contactwith the substrate 111. In the first upper conductive materials CMU1,upper pillars may be disposed in line along the first direction andspaced apart along the first direction. In the eighth upper conductivematerials CMU8, upper pillars may be disposed in line along the firstdirection and spaced apart along the first direction.

Each of the upper pillars PLU may include an information storage film116 and a channel film 114. The information storage film 116 may storeinformation by trapping or discharging charges. The information storagefilm 116 may include a tunneling insulation film, a charge trap film,and a blocking insulation film.

The channel films 114 may act as vertical bodies of the upper pillarsPLU. The channel films 114 may include an intrinsic semiconductor,respectively. The channel films 114 may include semiconductor having thesame conductivity type (e.g., p-type) as the substrate 111.

A plurality of lower pillars PLD may be formed. The plurality of lowerpillars PLD may penetrate the lower conductive materials CMD2 to CMD4and the lower conductive material CMD1 a or CMD1 b in a directionperpendicular to the substrate 111 so as to contact with the substrate111. In the lower conductive materials CMD 1 a, lower pillars may bedisposed in line along the first direction and spaced apart along thefirst direction. In the lower conductive materials CMD1 b, lower pillarsmay be disposed in line along the first direction and spaced apart alongthe first direction.

Each of the lower pillars PLD may include an information storage film116 and a channel film 114. The information storage film 116 may storeinformation by trapping or discharging charges. The information storagefilm 116 may include a tunneling insulation film, a charge trap film,and a blocking insulation film.

The channel films 114 may act as vertical bodies of the lower pillarsPLD. The channel films 114 may include an intrinsic semiconductor,respectively. The channel films 114 may include semiconductor having thesame conductivity type (e.g., p-type) as the substrate 111.

A plurality of pipeline contacts PC may be provided at the substrate111. The pipeline contacts PC may extend in a bit line direction so asto connect lower surfaces of upper pillars PLU formed at the first upperconductive material CMU1 with lower surfaces of lower pillars PLD formedat the lower conductive material CMD1 a. The pipeline contacts PC mayextend in a bit line direction so as to connect lower surfaces of upperpillars PLU formed at the eighth upper conductive material CMU8 withlower surfaces of lower pillars PLD formed at the lower conductivematerial CMD1 b.

In this embodiment, each of the pipeline contacts PC may include achannel film 114 and an information storage film 116. The channel films114 of the pipeline contacts PC may interconnect the channel films 114of the upper pillars PLU and channel films of the lower pillars PLD. Theinformation storage films 116 of the pipeline contacts PC mayinterconnect the information storage films 116 of the upper pillars PLUand the information storage films 116 of the lower pillars PLD.

A common source region CSR extending along the first direction may beprovided on the lower pillars PLD. The common source region CSR mayextend along the first direction so as to be connected with theplurality of lower pillars PLD. The common source region CSR may form acommon source line CSL. The common source region CSR may include ametallic material. The common source region CSR may have a conductivitytype different from the substrate 111.

Drains 320 may be provided on the upper pillars PLU. The drains 320 mayinclude a semiconductor material having a conductivity type (e.g.,n-type) different from the substrate 111. Bit lines BL may be formed onthe drains 320. The bit lines BL may be spaced apart along the firstdirection. The bit lines BL may extend along the second direction so asto be connected with the drains 320.

In this embodiment, the bit lines BL and the drains 320 can be connectedvia contact plugs, and the common source region CSR and the lowerpillars PLD can be connected via contact plugs.

One cell string may be formed of a lower pillar and an upper pillarconnected to each other via one pipeline contact.

In an exemplary embodiment, as described in FIGS. 43 to 45, the upperpillars PLU and the lower pillars PLD can be disposed in a zigzag shapealong the first direction.

A part EC of a top view in FIG. 51 may correspond to one ofabove-described equivalent circuits BLKa1 to BLKa7.

FIG. 54 is a plane view illustrating a part of one memory block in FIG.2 according to still another embodiment. FIG. 55 is a perspective viewtaken along a line X X X X X V-X X X X X V′ in FIG. 54. FIG. 56 is across-sectional view taken along a line X X X X X V-X X X X X V′ in FIG.54.

Referring to FIGS. 54 to 56, a common source region CSR may be formed ata substrate 111. The common source region CSR may be formed of onedoping region, for example. The common source region CSR may constitutea common source line CSL.

First to eighth conductive materials CM1 to CM8 may be formed on thecommon source region CSR. The first to eighth conductive materials CM1to CM8 may be stacked in a direction perpendicular to the substrate 111and spaced apart in a direction perpendicular to the substrate 111.Among the first to eighth conductive materials CM1 to CM8, conductivematerials constituting string selection transistors SST may be separatedby string selection line cuts SSL Cut. The string selection line cutsSSL Cut may extend along a first direction and spaced apart along asecond direction. Remaining conductive materials (not used for thestring selection transistors) may be formed on the common source regionCSR to have a plate shape extending along the first and seconddirections.

1

For example, the first to seventh conductive lines CM1 to CM7 may have aplate shape, and the eighth conductive materials CM8 may be separated bythe string selection line cuts SSL Cut. The eighth conductive materialsCM8 may extend along the first direction and spaced apart along thesecond direction.

A plurality of pillars PL may be provided to penetrate the first toeighth conductive materials CM1 to CM8 in a direction perpendicular tothe substrate 111 and to contact with the substrate 111. In one of theeighth conductive materials CM8, pillars PL may be provided in linealong the first direction. Each of the pillars PL may include aninformation storage film 116, a channel film 114, and an inner material115.

The information storage films 116 may store information by trapping ordischarging charges. The information storage films 116 may include atunneling insulation film, a charge trap film, and a blocking insulationfilm. The channel films 114 may act as vertical bodies of the pillarsPL. The channel films 114 may include intrinsic semiconductor. Thechannel films 114 may include a semiconductor material having the sametype (e.g., p-type) as the substrate 111. The inner materials 115 mayinclude an insulation material or air gap.

In an embodiment, as described in FIGS. 39 and 40, pillars PL may beformed of upper pillars and lower pillars. As described in FIGS. 43 to45, pillars PL may be disposed in a zigzag shape along the firstdirection.

FIG. 57 is a circuit diagram illustrating an equivalent circuit of apart EC of a top view in FIG. 54 according to an embodiment. Referringto FIGS. 54 to 57, a common source region CSR may be formed betweenpillars PL and a substrate 111.

Channels films 114 may be p-type, and the common source region CSR maybe n-type. A portion, corresponding to ground selection transistors GST,from among the channel films 114 may be p-type, and the common sourceregion CSR may be n-type. That is, the channel film 114 and the commonsource region CSR may form a PN junction. Accordingly, diodes D may beformed between cell strings CS11, CS12, CS21, and CS22 formed of pillarsPL and a common source line formed of the common source region CSR. Anequivalent circuit BLKf1 in FIG. 57 may be identical to that in FIG. 7except that the diodes D are provided therein.

The equivalent circuit BLKf1 may be applied like the above-describedequivalent circuits BLKa2 to BLKa7.

FIG. 58 is a perspective view taken along a line X X X X X V-X X X X XV′ in FIG. 54. FIG. 59 is a cross-sectional view taken along a line X XX X X V-X X X X X V′ in FIG. 54.

Referring to FIGS. 54, 58, and 59, conductive materials, constitutingground selection transistors GST, from among first to eighth conductivematerials CM1 to CM8 may extend along a first direction and spaced apartalong a second direction. The conductive materials constituting groundselection transistors GST may have the same structure as conductivematerials constituting string selection transistors SST. For example,the first conductive materials CM1 may have the same structure as theeighth conductive materials CM8.

In an embodiment, as described in FIGS. 39 and 40, pillars PL may beformed of upper pillars and lower pillars. As described in FIGS. 43 to45, pillars PL may be disposed in a zigzag shape along the firstdirection.

FIG. 60 is a circuit diagram illustrating an equivalent circuit of apart EC of a top view in FIG. 54 according to another embodiment.

Referring to FIGS. 54 and 58 to 60, diodes D may be formed between cellstrings CS11, CS12, CS21, and CS22 and a common source line CSL. Groundselection transistors GST may be connected with a plurality of groundselection lines GSL1 and GSL2. For example, ground selection transistorsof the cell strings CS11 and CS12 may be connected with a first groundselection line GSL1, and ground selection transistors of the cellstrings CS21 and CS22 may be connected with a second ground selectionline GSL2.

The equivalent circuit BLKf2 may be applied like the above-describedequivalent circuits BLKa2 to BLKa7.

FIG. 61 is a block diagram illustrating a memory system according to anembodiment. Referring to FIG. 61, a memory system 1000 may include anonvolatile memory device 1100 and a controller 1200.

The nonvolatile memory device 1100 may be substantially identical tothat of one of nonvolatile memory devices 100 to 500 according toembodiments. That is, the nonvolatile memory device 1100 may include aplurality of cell strings CS11, CS12, CS21, and CS22 provided on asubstrate 111 each of which includes a plurality of cell transistors CTstacked in a direction perpendicular to the substrate 111. Thenonvolatile memory device 1100 may make a program operation according tothe above-described program method. The nonvolatile memory device 1100may perform a state read operation to perform a program operation inview of charge rearrangement according to a state read result.

The controller 1200 may be connected with a host and the nonvolatilememory device 1100. In response to a request from the host, thecontroller 1200 may be configured to access the nonvolatile memorydevice 1100. For example, the controller 1200 may be configured tocontrol a read operation, a write operation, an erase operation, a stateread operation, a program operation considering rearrangement, and abackground operation of the nonvolatile memory device 1100. Thecontroller 1200 may be configured to provide an interface between thenonvolatile memory device 1100 and the host. The controller 1200 may beconfigured to drive firmware for controlling the nonvolatile memorydevice 1100.

The controller 1200 may be configured to provide the nonvolatile memorydevice 1100 with a control signal CTRL, a command CMD, and an addressADDR. In response to the control signal CTRL, the command CMD, and theaddress ADDR provided from the controller 1200, the nonvolatile memorydevice 1100 may perform a read operation, a write operation, a stateread operation, an erase operation, and a program operation consideringcharge rearrangement.

In an embodiment, the controller 1200 may further include constituentelements such as a processing unit, a host interface, and a memoryinterface. The processing unit may control an overall operation of thecontroller 1200.

The host interface may include the protocol for executing data exchangebetween the host and the controller 1200. Exemplarily, the hostinterface may communicate with an external device (e.g., the host) viaat least one of various protocols such as an USB (Universal Serial Bus)protocol, an MMC (multimedia card) protocol, a PCI (peripheral componentinterconnection) protocol, a PCI-E (PCI-express) protocol, an ATA(Advanced Technology Attachment) protocol, a Serial-ATA protocol, aParallel-ATA protocol, a SCSI (small computer small interface) protocol,an ESDI (enhanced small disk interface) protocol, and an IDE (IntegratedDrive Electronics) protocol. The memory interface may interface with thenonvolatile memory device 1100. The memory interface may include a NANDinterface or a NOR interface.

The memory system 1000 may be used as computer, portable computer, UltraMobile PC (UMPC), workstation, net-book, PDA, web tablet, wirelessphone, mobile phone, smart phone, e-book, PMP (portable multimediaplayer), digital camera, digital audio recorder/player, digitalpicture/video recorder/player, portable game machine, navigation system,black box, 3-dimensional television, a device capable of transmittingand receiving information at a wireless circumstance, one of variouselectronic devices constituting home network, one of various electronicdevices constituting computer network, one of various electronic devicesconstituting telematics network, RFID, or one of various electronicdevices constituting a computing system.

A nonvolatile memory device 1100 or a memory system 1000 may be packedby various types of packages such as PoP (Package on Package), Ball gridarrays (BGAs), Chip scale packages (CSPs), Plastic Leaded Chip Carrier(PLCC), Plastic Dual In-Line Package (PDI2P), Die in Waffle Pack, Die inWafer Form, Chip On Board (COB), Ceramic Dual In-Line Package (CERDIP),Plastic Metric Quad Flat Pack (MQFP), Thin Quad Flatpack (TQFP), SmallOutline (SOIC), Shrink Small Outline Package (SSOP), Thin Small Outline(TSOP), System In Package (SIP), Multi Chip Package (MCP), Wafer-levelFabricated Package (WFP), Wafer-Level Processed Stack Package (WSP), andthe like.

FIG. 62 is a flowchart for describing a program method of a memorysystem according to an embodiment. Referring to FIGS. 61 and 62, inoperation S1110, a controller 1200 may send a program command andprogram data to a nonvolatile memory device 1100. At this time, theremay be sent address of memory cells in which the program data is to bestored.

In operation S1120, the nonvolatile memory device 1100 may perform aprogram operation according to one of program methods according toembodiments. For example, the nonvolatile memory device 1100 may performa state read operation and may carry out a program operation accordingto a state read result. The nonvolatile memory device 1100 may perform astate read operation when program data is MSB data, and may execute aprogram operation according to a state read result. The nonvolatilememory device 1100 may perform a state read operation when program datais fine program data, and may execute a program operation according to astate read result. The nonvolatile memory device 1100 may store a stateread result in a supplemental area, and may use the stored state readresult in case of need. The nonvolatile memory device 1100 may read anduse a state read result from a test data region if necessary. Thenonvolatile memory device 1100 may detect (or, predict) a rearrangementcharacteristic according to previously programmed data and program datato perform a program operation according to a detected (or, predicted)result. The nonvolatile memory device 1100 may detect (or, predict) arearrangement characteristic according to previously programmed data,program data, and data to be programmed next to perform a programoperation according to a detected (or, predicted) result.

FIG. 63 is a flowchart for describing a state read method of a memorysystem according to an embodiment. Referring to FIGS. 61 and 63, inoperation S1210, a controller 1200 may send a state read command to anonvolatile memory device 1100. At this time, addresses of memory cellswhere a state read operation is to be carried out may be sent.

In operation S1220, the nonvolatile memory device 1100 may perform astate read operation according to an embodiment (operations S151 toS155).

In operation S1230, the nonvolatile memory device 1100 may send a stateread result to the controller 1200.

The controller 1200 may control various operations of the nonvolatilememory device 1100 such as programming, reading, and erasing, based onthe transferred state read result.

The controller 1200 may receive previously stored data from thenonvolatile memory device 1100 and program data and data to beprogrammed next from an external device, and may decide levels of averification voltage to be used at programming of the program data tosend it to the nonvolatile memory device with the program data.

FIG. 64 is a block diagram illustrating an application of a memorysystem in FIG. 61. Referring to FIG. 64, a memory system 2000 mayinclude a nonvolatile memory device 2100 and a controller 2200. Thenonvolatile memory device 2100 may include a plurality of nonvolatilememory chips, which form a plurality of groups. Nonvolatile memory chipsin each group may be configured to communicate with the controller 2200via one common channel. In an embodiment, the plurality of nonvolatilememory chips may communicate with the controller 2200 via a plurality ofchannels CH1 to CHk.

Each of the nonvolatile memory chips may be substantially identical tothat of one of nonvolatile memory devices 100 to 500 according toembodiments. That is, the nonvolatile memory device 2100 may include aplurality of cell strings CS11, CS12, CS21, and CS22 provided on asubstrate 111 each of which includes a plurality of cell transistors CTstacked in a direction perpendicular to the substrate 111. Thenonvolatile memory device 2100 may perform a state read operationaccording to embodiments, and may perform a program operationconsidering rearrangement according to a state read result. Thecontroller 2200 may control the nonvolatile memory device 2100 so as toperform a state read operation and a program operation according toembodiments. The controller 2200 may control the nonvolatile memorydevice 2100 so as to perform a state read operation according toembodiments, and may control operations of the nonvolatile memory device3100 according to a state read result.

In FIG. 64, there is described the case that one channel is connectedwith a plurality of nonvolatile memory chips. However, the memory system2000 can be modified such that one channel is connected with onenonvolatile memory chip.

FIG. 65 is a diagram illustrating a memory card according to anembodiment. Referring to FIG. 65, a memory card 3000 may include anonvolatile memory device 3100, a controller 3200, and a connector 3300.

The nonvolatile memory device 3100 may be substantially identical tothat of one of nonvolatile memory devices 100 to 500 according toexemplary embodiments. That is, the nonvolatile memory device 3100 mayinclude a plurality of cell strings CS11, CS12, CS21, and CS22 providedon a substrate 111 each of which includes a plurality of celltransistors CT stacked in a direction perpendicular to the substrate111. The nonvolatile memory device 3100 may perform a state readoperation according to embodiments, and may perform a program operationconsidering rearrangement according to a state read result. Thecontroller 3200 may control the nonvolatile memory device 3100 so as toperform a state read operation and a program operation according toembodiments. The controller 3200 may control the nonvolatile memorydevice 3100 so as to perform a state read operation according toembodiments, and may control operations of the nonvolatile memory device3100 according to a state read result.

The connector 3300 may connect the memory card 3000 with a hostelectrically.

The memory card 3000 may be formed of memory cards such as a PC (PCMCIA)card, a CF card, an SM (or, SMC) card, a memory stick, a multimedia card(MMC, RS-MMC, MMCmicro), a security card (SD, miniSD, microSD, SDHC), auniversal flash storage (UFS) device, and the like.

FIG. 66 is a diagram illustrating a solid state drive according to anembodiment. Referring to FIG. 66, a solid state drive 4000 may include aplurality of nonvolatile memory devices 4100, a controller 4200, and aconnector 4300.

Each of the nonvolatile memory devices 4100 may be substantiallyidentical to that of one of nonvolatile memory devices 100 to 500according to exemplary embodiments. That is, each of the nonvolatilememory devices 4100 may include a plurality of cell strings CS11, CS12,CS21, and CS22 provided on a substrate 111 each of which includes aplurality of cell transistors CT stacked in a direction perpendicular tothe substrate 111. The nonvolatile memory device 4100 may perform astate read operation according to embodiments, and may perform a programoperation considering rearrangement according to a state read result.The controller 4200 may control the nonvolatile memory device 4100 so asto perform a state read operation and a program operation according toembodiments. The controller 4200 may control the nonvolatile memorydevice 4100 so as to perform a state read operation according toembodiments, and may control operations of the nonvolatile memory device4100 according to a state read result.

The connector 4300 may connect the solid state driver 4000 with a hostelectrically.

FIG. 67 is a block diagram illustrating a computing system according toan embodiment. Referring to FIG. 67, a computing system 5000 may includea central processing unit 5100, a RAM 5200, a user interface 5300, amodem 5400, and a memory system 5600.

The memory system 5600 may be connected electrically with the elements5100 to 5400 via a system bus 5500. Data provided via the user interface5300 or processed by the central processing unit 5100 may be stored inthe memory system 5600.

The memory system 5600 may include a nonvolatile memory device 5610 anda controller 5620. The memory system 5600 may be formed of one of memorysystems 1000 and 2000, a memory card 3000, and a solid state drive 4000according to embodiments.

The above-disclosed subject matter is to be considered illustrative, andnot restrictive. Many alternatives embodiments are intended to fallwithin the scope of the invention. For example, while the aboveembodiments have focused on a memory cell storing data as a thresholdvoltage in a memory cell transistor, the invention is equally applicableto other memory cell types, and the characteristics may representingdata may be different. For example, a range of resistances values mayrepresent a program state in a PRAM memory device, with multiple rangesrepresenting multiple program states. Other factors besides thosedescribed herein may affect the shifting of the memory devicecharacteristic representing data (e.g., a shift in voltage threshold orresistance value). The appended claims are intended to cover all suchmodifications, enhancements, and other embodiments, which fall withinthe true spirit and scope. Thus, to the maximum extent allowed by law,the scope is to be determined by the broadest permissible interpretationof the following claims and their equivalents, and shall not berestricted or limited by the foregoing detailed description.

What is claimed is:
 1. A non-volatile memory device comprising: bitlines; word lines; a three dimensional array of memory cells comprisinga plurality of memory cell strings, each memory cell string including avertical stack of memory cells connected to a respective bit line, andmemory cells of different memory cell strings connected to a respectiveword line; a page buffer including first latches and second latchesconnected to corresponding bit lines, first latches configured to storedata; a voltage generator configured to generate a program voltage; arow decoder configured to decode an address and select a word line; acontrol unit configured to control a programming operation includingperforming a plurality of program loops, each program loop comprisingapplication of a program pulse to a word line selected by the rowdecoder and a plurality of sequential verify operations to verifyrespective program levels of a first row of memory cells connected tothe selected word line, wherein the first latches of the page buffer areconfigured to inhibit or allow a programming operation on respectivememory cells of the first row connected to bit lines corresponding tothe first latches, and wherein the second latches are configured toselect one of a plurality of verify results corresponding to each of theplurality of verify operations of a program loop.
 2. The non-volatilememory device of claim 1, wherein the control unit is configured tocontrol a programming operation to modify a memory cell characteristicof each of the memory cells of the first row to one of a plurality ofprogram states, each program state representing a different data set ofone or more bits of data.
 3. The non-volatile memory device of claim 2,wherein the control unit is configured to perform a plurality of programloops, each program loop comprising a plurality of verify operations forat least one of the program states.
 4. The non-volatile memory device ofclaim 3, wherein the second latches are rearrangement latches and areconfigured to store rearrangement data indicating a charge rearrangementcharacteristic of the first row of memory cells, wherein one of theplurality of verify results is selected based upon the rearrangementdata of corresponding rearrangement latches.
 5. The non-volatile memorydevice of claim 4, wherein the control unit is configured to perform astate read operation of a least significant bit program state of thefirst row of memory cells to generate and store in correspondingrearrangement latches corresponding rearrangement data effective toselect one of the plurality of verify results when programming leastsignificant bits and additional bits into the first row of memory cells.6. The non-volatile memory device of claim 4, wherein the control unitis configured to perform a state read operation of a first program stateincluding a first read operation with a first read voltage applied tothe elected word line and a second read operation with a second readvoltage, higher than the first read voltage, applied to the selectedword line, the first read voltage and second read voltage having amagnitude within a threshold range representing the first program state,wherein the rearrangement data of the rearrangement latches includeinformation of a result of the state read operation.
 7. The non-volatilememory device of claim 6, wherein the control unit determines memorycells of the first row of memory cells having an increasing thresholdcharge rearrangement characteristic as those memory cells of the firstrow having a threshold voltage higher than the second read voltage, andmemory cells of the first row of memory cells having a decreasingthreshold charge rearrangement characteristic as those memory cells ofthe first row having a threshold voltage lower than the first readvoltage.
 8. The non-volatile memory device of claim 7, wherein thecontrol unit is configured to store data in the rearrangement latchessuch that memory cells determined to have an increasing threshold chargerearrangement characteristic select verify results of a first verifyvoltage of memory cells to be programmed to a second program state andsuch that memory cells determined to have a decreasing threshold chargerearrangement characteristic select verify results of a second verifyvoltage higher than the first verify voltage of memory cells to beprogrammed to a second program state.
 9. The non-volatile memory deviceof claim 6, wherein the control unit is configured to generate therearrangement data stored in the rearrangement latches as a function ofthe result of the state read operation and as a function of aprogramming operation of memory cells of a neighboring word line to theselected word line after the first row of memory cells connected to theselected word line is programmed to include the first program state. 10.The non-volatile memory device of claim 9, wherein the control unit isconfigured to generate the rearrangement data stored in therearrangement latches as a function of the result of the state readoperation and as a function of a voltage threshold difference betweenmemory cells of the selected word line and adjacent memory cells of theneighboring word line.
 11. The non-volatile memory device of claim 9,wherein the control unit is configured to generate the rearrangementdata stored in the rearrangement latches as a function of the result ofthe state read operation and as a function of a voltage threshold changeadjacent memory cells of the neighboring word line after at least someof the first row of memory cells connected to the selected word line areprogrammed to include the first program state.
 12. The non-volatilememory device of claim 4, wherein the control unit is configured toperform a state read operation of an erase state of the first row ofmemory cells connected to the selected word line, including a first readoperation with a first read voltage applied to the selected word lineand a second read operation with a second read voltage, higher than thefirst read voltage, applied to the selected word line, the first readvoltage and second read voltages having a magnitude within a thresholdrange representing the erase state, wherein the rearrangement data ofthe rearrangement latches includes information of a result of the stateread operation.
 13. The non-volatile memory device of claim 4, whereinthe control unit is configured to control a programming operationincluding performing one or more first program loops followed by one ormore second program loops, each first program loop comprisingapplication of a program pulse to the selected word line and nsequential verify operations to verify respective program levels of thefirst row of memory cells connected to the selected word line, eachsecond program loop comprising application of a program pulse to theselected word line and m sequential verify operations to verifyrespective program levels of the first row of memory cells connected tothe selected word line, where n is an integer equal or greater than one,and m is an integer greater than n, wherein the control unit isconfigured to perform a state read operation after the one or more firstprogram loops and before the one or more second program loops, whereinthe rearrangement data of the rearrangement latches include informationof a result of the state read operation.
 14. The non-volatile memorydevice of claim 13, wherein the control unit is configured to stopperforming the one or more first program loops after determining athreshold condition.
 15. The non-volatile memory device of claim 13,where n equals
 1. 16. The non-volatile memory device of claim 3, whereinthe control unit is configured to perform a plurality of program loops,each program loop comprising a first plurality of verify operations fora first program state and a second plurality of verify operations for asecond program state, the first program state representing the samefirst data set for each memory cell programmed to the first data state,and the second program state representing the same second data set foreach memory cell programmed to the second data state.
 17. Thenon-volatile memory device of claim 3, wherein the memory array includesa user data area including the first row of memory cells and a separatedata area, wherein the control unit is configured to load the secondlatches with first data stored in the separate data area of the array ofmemory cells, wherein one of the plurality of verify results is selectedbased upon the data loaded into corresponding second latches.
 18. Thenon-volatile memory device of claim 17, wherein the control unit isconfigured to perform a state read operation of at least one of a firstprogram state and an erase state including a first read operation with afirst read voltage applied to the selected word line and a second readoperation with a second read voltage, higher than the first readvoltage, applied to the selected word line, the first read voltage andsecond read voltages having a magnitude within a threshold rangerepresenting the corresponding first program state or the erase state,wherein results of the state read operation are the first data stored inthe separate data area of the array of memory cells.
 19. Thenon-volatile memory device of claim 3, wherein the control unit isconfigured to analyze a program operation of a word line, adjacent tothe selected word line, to be performed subsequent to the a programoperation of the selected word line and load the second latches withdata including information of the analysis, wherein one of the pluralityof verify results is selected based upon the data loaded intocorresponding second latches.
 20. The non-volatile memory device ofclaim 3, wherein the control unit is configured to perform a state readoperation of at least one of a first program state and an erase stateincluding a first read operation with a first read voltage applied tothe selected word line and a second read operation with a second readvoltage, higher than the first read voltage, applied to the selectedword line, the first read voltage and second read voltages having amagnitude within a threshold range representing the corresponding firstprogram state or the erase state, wherein the control unit is configuredto analyze a program operation of a word line, adjacent to the selectedword line, subsequent to the a program operation of the selected wordline, and wherein the control unit is configured to load the secondlatches with data including information of the state read operation andthe analysis.
 21. A non-volatile memory device comprising: an array ofmemory cells arranged in rows in columns, rows of memory cells connectedto corresponding word lines, columns of memory cells connected tocorresponding bit lines; a voltage generator configured to generate aprogram voltage; a page buffer including first latches and secondlatches connected to corresponding bit lines, first latches configuredto temporarily store data to be stored in a row of memory cells to beprogrammed; a row decoder configured to decode an address and select aword line; a control unit configured to control a programming operationincluding performing a plurality of program loops each program loopcomprising application of a program pulse to a word line selected by therow decoder and a plurality of sequential verify operations to verifyrespective voltage threshold levels of a first row of memory cellsconnected to the selected word line; wherein the first latches of thepage buffer are configured to inhibit or allow a programming operationon respective memory cells of the first row connected to bit linescorresponding to the first latches, wherein the control unit isconfigured control a coarse programming operation to program the firstrow of memory cells to a plurality of coarse program state, each of theplurality of coarse program states corresponding to a fine programstate, wherein the control unit is configured to perform a state read ofthe first row of the memory cells when in a coarse program state todetermine a tendency of a threshold voltage of each memory cell toshift, and wherein the second latches are configured to storeinformation of the result of the state read, and configured to select,in response to the information stored in the second latches, one of aplurality of verify results corresponding to each of the plurality ofverify operations of a program loop.
 22. The non-volatile memory deviceof claim 21, wherein the array of memory cells includes a user data areaincluding the first row of memory cells, and a buffer area configured tostore data to be programmed into the user data area, wherein at leastsome of the first row of memory cells include a charge rearrangementcharacteristic that alters the threshold levels of the at least some ofthe first row of memory cells after a programming operation includingthe coarse programming operation, wherein the control unit is configuredto access the buffer area to determine to which of the plurality ofcoarse program states memory cells of the first row of memory cells werepreviously programmed, and wherein results of the state read of thefirst row of the memory cells when in the coarse program by the controlunit are responsive to the access of the buffer area by the controlunit.
 23. The non-volatile memory device of claim 22, wherein thecontrol unit is configured to control a fine programming operation toprogram each of the first row of memory cells to a fine program staterespectively corresponding to a coarse program state.
 24. A solid statedrive (SSD) comprising: a plurality of non-volatile memory devices; amemory controller configured to control operations of a plurality ofnon-volatile memory devices; and a plurality of channels configured toprovide communications between the plurality of non-volatile memorydevices and the memory controller, wherein each non-volatile memorydevice comprises: an array of memory cells arranged in rows in columns,rows of memory cells connected to corresponding word lines, columns ofmemory cells connected to corresponding bit lines; a page bufferincluding first latches and second latches connected to correspondingbit lines, first latches configured to store data; a voltage generatorconfigured to generate a program voltage; a row decoder configured todecode an address and select a word line; a control unit configured tocontrol a programming operation including performing a plurality ofprogram loops each program loop comprising application of a programpulse to a word line selected by the row decoder and a plurality ofsequential verify operations to verify respective program levels of afirst row of memory cells connected to the selected word line, the firstlatches of the page buffer being configured to inhibit or allow aprogramming operation on respective memory cells of the first rowconnected to bit lines corresponding to the first latches, and thesecond latches being configured to select one of a plurality of verifyresults corresponding to each of the plurality of verify operations of aprogram loop.